Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

STP single-component moisture curing solvent-free polyurethane fitness footpath

A solvent-free polyurethane and moisture-curing technology, which is applied in roads, roads, pavements, etc., can solve the problems of no strength, no shock absorption, fall resistance, environmental pollution, etc., to reduce injuries, ensure stability, and reduce curing effects. Good results

Inactive Publication Date: 2019-05-10
山东扬名新材料技术有限公司
View PDF6 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

No shock absorption and anti-fall function
[0005] (2) Ordinary elastic runway: copy the plastic runway or EDPM runway, the light on the track is elastic and has no strength
[0008] Organic solvents are of great help to the scraping and leveling of polyurethane products for runways, so at present, organic solvents are added to some polyurethane products for runways, and organic solvents will not participate in the reaction and stabilize inside the system, but Volatilize into the atmosphere, which will cause serious pollution to the environment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • STP single-component moisture curing solvent-free polyurethane fitness footpath
  • STP single-component moisture curing solvent-free polyurethane fitness footpath

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] A STP one-component moisture-curing solvent-free polyurethane fitness walkway, which is composed of a bottom layer (1), an elastic layer (2), a reinforcement layer (3) and a granular aggregate layer (4), and the bottom layer (1) is directly laid On the ground, the elastic layer (2) is directly laid on the bottom layer (1), the reinforcement layer (3) is laid on the elastic layer (2), and the granular aggregate layer (4) is laid on the reinforcement layer (3) ) above.

[0035] The bottom layer (1) is formed by uniform coating of one-component moisture-curing solvent-free polyurethane on the ground.

[0036] The elastic layer (2) is formed by adding a drier to the one-component moisture-curing solvent-free polyurethane elastomer and uniformly coating it on the bottom layer (1). The thickness of the elastic layer (2) is 5MM, and its elongation ≥800%, breaking strength ≥1.2MPA.

[0037] The strengthening layer (3) is formed by evenly coating the elastic layer (2) with one...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to an STP single-component moisture curing solvent-free polyurethane fitness footpath and belongs to the technical field of plastic runways. The STP single-component moisture curing solvent-free polyurethane fitness footpath is composed of a bottom layer, an elastic layer, a reinforced layer and a particle aggregate layer. The bottom layer is directly laid on the ground; theelastic layer is directly laid above the bottom layer; the reinforced layer is laid above the elastic layer; and the particle aggregate layer is laid above the reinforced layer. A single-component moisture curing solvent-free polyurethane elastomer is composed of a single component, the situation of poor curing effect caused by inaccurate proportioning during construction is reduced, and the material stability is guaranteed to the maximum degree. The reinforced layer adopts a high-strength polyurethane product, and the high tenacity and high strength are provided. According to the fitness runway, harm caused by high-strength walking is reduced, meanwhile damage to the elastic runway due to bicycle exercises is avoided, and the characteristics of high resistance to staining, high resistanceto acid and alkali, resistance to sliding, resistance to water and noise reduction are achieved.

Description

technical field [0001] The invention relates to a fitness walk, in particular to an STP single-component moisture-curing solvent-free polyurethane fitness walk. Background technique [0002] A fitness trail is a path that provides people with mainly walking and running exercises. In addition to walking and running on the fitness trail, people can also exercise on the trail by cycling, roller skating, and skateboarding. The wide range of use of fitness trails determines its performance requirements: elasticity, high strength, high wear resistance, and long life. [0003] At present, the existing forms of fitness trails mainly include the following types: [0004] (1) Simple color change: Carry out simple road color change on the basis of cement and asphalt, and the trail has hardness and no elasticity. There is no shock absorption and anti-fall function. [0005] (2) Ordinary elastic track: just copy the plastic track or EDPM track, the track is light and elastic, but has...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): E01C13/06
Inventor 李自升
Owner 山东扬名新材料技术有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com