Check patentability & draft patents in minutes with Patsnap Eureka AI!

Face mass recognition attendance system and method

A face recognition and attendance technology, applied in the field of face recognition, can solve problems such as low attendance efficiency, high cost, and long attendance time, and achieve the effect of improving attendance efficiency and reducing attendance costs

Inactive Publication Date: 2019-06-14
北京智慧云行科技有限责任公司
View PDF9 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

After using this technology, employees must queue up to pass through the attendance machine when entering the company. If the company is relatively large and the number of employees is large, this will cause some problems: employees line up to pass the attendance machine during commute time, and the attendance time is too long. The efficiency of attendance is low, and the company needs to purchase a large number of attendance machines for attendance, and the cost is relatively high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Face mass recognition attendance system and method
  • Face mass recognition attendance system and method
  • Face mass recognition attendance system and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0033] see Figure 1-3 , the embodiment of the present invention provides a batch recognition attendance system of faces, comprising: a data acquisition module, which collects face image data of at least two attendance objects at the same time;

[0034] The model generation module obtains the face prediction model through the face recognition algorithm according to the face image data, matches the identification ID of the corresponding attendance object according t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a face mass recognition attendance system and method. The face mass recognition attendance system comprises a data acquisition device, a model generation module, a data processing module, a data display module, a data storage module and a report generation module, and a target detection method based on deep learning is adopted and comprises the steps that images of a personin an uploaded panoramic image file are detected, positioned and divided into each face image in the panoramic image file, and the detected face images in the panoramic image file are sliced, encodedand filed.

Description

technical field [0001] The invention relates to the field of face recognition, in particular to a face batch recognition attendance system and method. Background technique [0002] Face recognition technology recognizes the physical characteristics of the faces of people in pictures or videos, so as to perform a series of subsequent operations on the authenticated faces. The main available large-scale scenarios include security, security checks, traffic management, etc. Small-scale scenarios include Home security monitoring, company attendance, etc., the current face recognition technology used for attendance basically focuses on designing an attendance machine device, which includes a small network camera, a small face-sized display screen, and possibly Includes a fingerprint recognition device. After using this technology, employees must queue up to pass through the attendance machine when entering the company. If the company is relatively large and the number of employee...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G07C1/10G06K9/00
Inventor 罗巍李昂胥超范晋康李海英
Owner 北京智慧云行科技有限责任公司
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More