Liquid-sealed structure and vacuum magnetron sputtering device for rotating cathode
A rotating cathode and liquid sealing technology, applied in sputtering coating, vacuum evaporation coating, metal material coating process, etc., can solve the problems of loss, poor wear resistance, water leakage, etc.
Active Publication Date: 2021-04-09
捷造科技(宁波)有限公司
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Problems solved by technology
[0005] In the prior art, most of the seals used for cooling water in the vacuum magnetron sputtering rotating cathode are in the form of aprons, and the aprons are mostly used for static seals. When used for dynamic seals, they are easily damaged due to poor wear resistance, resulting in water leakage or even other unnecessary losses
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[0030] The present application discloses a liquid sealing structure for a rotating cathode. In the vacuum magnetron sputtering rotating cathode, the liquid sealing structure is used for dynamic and static sealing of cooling water. The high-gloss surface of the two sealing rings directly contacts to provide dynamic sealing. , The dynamic sealing surface provides an appropriate axial force to ensure good dynamic sealing and protect the dynamic sealing surface. Therefore, this liquid sealing structure effectively improves the reliability of the rotating water seal in the vacuum magnetron sputtering rotating cathode, solves the problem of poor cooling effect on the target surface, avoids tumor buildup and arcing on the target surface, and improves the cooling water flow rate to ensure the sputtering power supply works Power cap increased.
[0031] The liquid-tight structure provided by the present application will be introduced and illustrated in detail below through specific embo...
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The present application discloses a liquid sealing structure for a rotating cathode. The above liquid sealing structure is used for dynamic and static sealing of cooling water in a vacuum magnetron sputtering rotating cathode. One end of the first sealing ring is provided with a fixed The other end is in plane contact with the second sealing ring; the direct contact between the high-gloss surfaces of the two sealing rings provides dynamic sealing, and the dynamic sealing surface provides an appropriate axial force to ensure good dynamic sealing and protect the dynamic sealing surface. Therefore, the above-mentioned liquid sealing structure can not only ensure the supply of high-pressure and large-flow cooling water, reduce target area tumors and arcing phenomena, but also ensure a higher sputtering rate. Moreover, the adoption of the above-mentioned liquid sealing structure in the vacuum magnetron sputtering rotary cathode can effectively meet the urgent needs of the rotary cathode for high-quality sealing performance and long-term maintenance-free cooling cycle sealing structure during its use.
Description
technical field [0001] The invention relates to the technical field of sealing structures, and more specifically, the invention relates to a sealing structure for hydraulic sealing of a rotating cathode. Background technique [0002] Vacuum magnetron sputtering is a kind of physical vapor deposition (Physical Vapor Deposition, PVD). The working principle is that under the action of the electric field E, the electrons collide with the argon atoms in the process of flying to the substrate, so that they are ionized to generate Ar positive ions and new electrons; the new electrons fly to the substrate, and the Ar ions react in the electric field Under the acceleration, it flies to the cathode target, and bombards the target surface with high energy, so that the target material is sputtered, and the coating is completed on the material. [0003] Magnetron sputtering includes many types, mainly planar magnetron sputtering and cylindrical magnetron sputtering deposition technology...
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IPC IPC(8): C23C14/35
CPCC23C14/3407C23C14/35
Inventor 张迎春张源
Owner 捷造科技(宁波)有限公司