Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Nanoimprint template and preparation method thereof

A nano-imprinting and template technology, applied in the field of nano-imprinting, can solve the problems of nano-imprinting template and substrate deviation from the alignment position, reduce imprinting alignment accuracy, and low Young's modulus, so as to achieve overall rigidity increase, The effect of improving alignment accuracy and improving flatness

Pending Publication Date: 2019-10-22
BOE TECH GRP CO LTD
View PDF4 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the Young's modulus of the nanoimprint template in the prior art is low, and it is prone to deformation, and due to stress concentration and local deformation during imprinting, the nanoimprint template and the substrate deviate from the preset alignment Location
[0004] In summary, the nano-imprint templates in the prior art are prone to deformation and abnormal alignment, which greatly reduces the accuracy of imprint alignment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nanoimprint template and preparation method thereof
  • Nanoimprint template and preparation method thereof
  • Nanoimprint template and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] The embodiment of the present application provides a nanoimprint template, such as figure 1 As shown, the nanoimprint template includes: a flexible substrate 1, an alignment functional layer 3 on the flexible substrate 1 bonded to the flexible substrate 1 by a first bonding glue 2, and an alignment functional layer 3 located on the alignment The adhesive layer 4 on the functional layer 3; the alignment functional layer 3 has an alignment mark pattern.

[0042] The nano-imprint template provided in the embodiment of the present application can improve the overall rigidity of the nano-imprint template by setting an alignment functional layer, thereby improving the anti-deformation ability of the nano-imprint template, avoiding alignment abnormalities, and further improving nano-imprint performance. Alignment accuracy in process. Moreover, when the nanoimprint template provided by the embodiment of the present application is used to imprint on a substrate with a step diff...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a nanoimprint template and a preparation method thereof. The deformation resistance of the nanoimprint template is improved. The nanoimprint template comprises a flexible substrate, an alignment function layer and a bonding layer, wherein the alignment function layer is located on the flexible substrate and bonded with the flexible substrate through first bonding glue, andthe bonding layer is located on the alignment function layer. The alignment function layer is provided with an alignment mark pattern.

Description

technical field [0001] The present application relates to the technical field of nanoimprinting, in particular to a nanoimprinting template and a preparation method thereof. Background technique [0002] Nanoimprint technology has the advantages of high resolution, simple process, low cost, high yield, and large-scale production. It has become the most promising next-generation optical technology. Applications. [0003] In the existing nanoimprinting process, certain geometric figures are respectively designed on the surfaces of the nanoimprinting template and the substrate as alignment marks, so that the alignment marks between the nanoimprinting template and the substrate can be seen under a microscope. Align the alignment marks of the nanoimprint template and the substrate to determine the position of the nanoimprint template and the substrate, and then perform the nanoimprint process. However, the Young's modulus of the nanoimprint template in the prior art is low, and...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002
Inventor 谭伟刘震郭康谷新
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com