Curved exposure apparatus and method
A technology of exposure device and exposure method, which is applied in the direction of photolithography process exposure device, microlithography exposure equipment, optics, etc., to save time and cost, improve product qualification rate, and control exposure area.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0023] The present invention will be described in detail below in conjunction with specific embodiments shown in the accompanying drawings.
[0024] In each drawing of the present invention, for convenience of illustration, some dimensions of structures or parts are exaggerated relative to other structures or parts, and therefore, are only used to illustrate the basic structure of the subject matter of the present invention.
[0025] It should be understood that although the terms first, second, etc. may be used herein to describe various elements or structures, these described objects should not be limited by these terms. These terms are only used to distinguish these described objects from one another.
[0026] see figure 1 , the curved surface exposure device 100 provided by an embodiment of the present invention includes a base 1, a bracket 2 erected on the base 1, a control mechanism, and an object-carrying mechanism 3 arranged on the base 1. The object-carrying mechanis...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


