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pressure measurement system

A measuring system and pressure technology, applied in measuring devices, measuring fluid pressure, vacuum gauges that measure medium pressure by measuring changes in thermal conductivity of medium, etc. , prone to human errors and other problems, to achieve the effect of fault judgment and cost reduction

Active Publication Date: 2021-09-28
ULVAC INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, when assembling and installing the vacuum processing apparatus, there is a problem that operations such as setting and changing the set value (setting value) of the vacuum gauge cannot be performed in any way because the power supply is not received.
On the other hand, after receiving power supply from the main body of the device, even when setting and changing the set value (set value), it is sometimes necessary to observe the change in the output of the sensor unit and operate it in the narrow working space of the vacuum processing device. Potentiometers, etc., this job takes a lot of time
Moreover, when a new vacuum gauge is replaced due to failure, it is necessary to transfer (set) the existing set value to the new vacuum gauge, but setting and changing the set value (setting value) as described above is prone to human error. Mistakes

Method used

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Embodiment Construction

[0018] Referring to the drawings, in order to set the object to be measured Vc vacuum chamber vacuum processing apparatus, the vacuum gauge installation in the vacuum chamber is set to Vc Pirani vacuum gauge PG example, a pressure measurement of the present invention MS system embodiments.

[0019] Refer figure 1 with figure 2 , PG Pirani gauge has a body 1, a pipe body provided with a later-described sensor elements constituting the sensor portion 2 has a flange which can be mounted to a vacuum chamber in which one side Vc 2a. like figure 2 (A), the tube body 2 having a sensor 21 such as a filament of platinum material. On the other hand, if figure 2 (B), in the main body 1 includes: a sensor section 20, which operates receiving a power supply; microcomputer 30 includes a control unit and a memory, which supplies power to the sensor section 20, and input from the sensor unit 20 is performed , and outputs a predetermined signal; a first power supply circuit portion 40, which recei...

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Abstract

The present invention provides a pressure measurement system including a vacuum gauge which can easily set and change the set value. The pressure measurement system (MS) of the present invention has: a vacuum gauge and a terminal (Mt). The main body of the vacuum gauge is mounted on the object to be measured, and the main body has a sensor part (20) that receives power supply and work; the control part (30), which controls the operation of the sensor part, and processes the input from the sensor part, and outputs a prescribed signal; and the power supply circuit part (40, 50), which supplies power to the control part and the sensor part; A terminal (Mt) is freely communicably connected to the control unit via a communication line (60), and can supply power to the power supply circuit unit by wire or wirelessly. The vacuum gauge can determine the power supply from the terminal to the control unit, and when the power is supplied from the terminal to the control unit, the control unit of the vacuum gauge and the terminal are freely communicably connected to each other via a communication line.

Description

Technical field [0001] The present invention relates to a body mounted on the object to be measured on a pressure measurement system and measuring the gauge of its internal pressure. Background technique [0002] Conventionally, a vacuum apparatus and instruments in order to measure the subatmospheric pressure (vacuum), with the use and the environment pressure region corresponding to the measurement principle various different gauge. Pirani vacuum gauge to the vacuum processing apparatus embodiment of the vacuum processing on a predetermined substrate to be processed silicon wafer and a glass substrate or the like used as an example, in a Pirani gauge having a measurement object vacuum processing apparatus body of the vacuum chamber can be freely mounted, is provided inside the body: a sensor unit, which receives power supply operates; a control unit which controls operation of the sensor unit and processes the input from the sensor section, outputs a predetermined signal; and a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01L21/00
CPCG01L21/00G01L19/086G01L19/12G01L21/12G01L19/0061G01L19/02G01L19/08
Inventor 佐藤贵伸中岛丰昭宫下刚福原万沙洋吉泽秀树
Owner ULVAC INC
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