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Sill micro-gap structure for elevator

A gap and elevator technology, applied in the field of elevator equipment, can solve the problems of inconvenient installation and door panel connection, etc., and achieve the effects of enhancing stability and convenience, convenient disassembly, and improved convenience.

Pending Publication Date: 2021-02-12
北京升华数能装备有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a sill micro-slit structure for elevators, so as to solve the problems that the micro-slit technology proposed in the above-mentioned background technology is not convenient for later installation and cannot be quickly connected with door panels

Method used

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  • Sill micro-gap structure for elevator

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Embodiment Construction

[0019]The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.

[0020]SeeFigure 1-4, An embodiment provided by the present invention:

[0021]A sill micro-gap structure for elevators, comprising a bottom plate 1, the outer surface of the bottom plate 1 is connected with a first connecting rod 2, the outer surface of the bottom plate 1 is connected with a second connecting rod 3, and the end of the first connecting rod 2 away from the bottom plate 1 is connected There is a left baffle 8. The inner surface of th...

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Abstract

The invention relates to the technical field of elevator equipment, in particular to a sill micro-gap structure for an elevator. The structure comprises a bottom plate; a first connecting rod is connected with the outer surface of the bottom plate; a second connecting rod is connected with the outer surface of the bottom plate; a left baffle is connected with the end, away from the bottom plate, of the first connecting rod; the second connecting rod is connected with the inner surface of the left baffle; a first linkage device is connected with the outer surface of the left baffle; a roller isconnected with the top end of the first linkage device; a spring is connected with the outer surface of the first linkage device; a second linkage device is connected with the end, away from the first linkage device, of the spring; and a first connecting block is connected with the top end of the bottom plate. According to the sill micro-gap structure for the elevator, by means of a rapid mounting device and a connecting device, later-period mounting of a micro-gap technology is facilitated; and meanwhile, a car door on the elevator can be connected, so that a user can conveniently use the elevator, and the working efficiency of workers is improved.

Description

Technical field[0001]The invention and the technical field of elevator equipment are specifically a sill micro-slit structure for elevators.Background technique[0002]In existing lift elevators, there is often a large gap between the car door and the hall door. This gap is allowed in the national standard. The qualification standard for the gap is within 30 mm. The existence of the gap is necessary. When the passenger or cargo is being carried, the weight of the passengers or cargo in the car will change. At this time, the car will vibrate or shake. This gap can prevent the collision of the car and the hall door sill from causing the car and hoistway. However, the existence of this gap creates certain hidden safety hazards. Even the gaps that meet the standards will also produce some unexpected safety hazards. For example, women’s high-heeled shoes are easy to jam into the gap, and small objects such as keys will fall through the gap. Entering the hoistway causes risks such as fallin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B66B13/06B66B13/30
CPCB66B13/06B66B13/301
Inventor 罗海闽杜树鑫
Owner 北京升华数能装备有限公司
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