Workbench equipment and method for measuring vertical zero clearing error of workbench

A workbench and vertical technology, applied in the direction of measuring devices, instruments, optical devices, etc., can solve the problem that the interferometer system cannot cover the entire stroke of the workbench

Active Publication Date: 2021-03-05
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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  • Application Information

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Problems solved by technology

[0005] The embodiment of the present invention provides a workbench equipment and a method for measuring the vertical zeroing error of the workbench to solve the problem that a set of interferometer systems cannot cover the entire stroke of the workbench when measuring the vertical zeroing error

Method used

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  • Workbench equipment and method for measuring vertical zero clearing error of workbench
  • Workbench equipment and method for measuring vertical zero clearing error of workbench
  • Workbench equipment and method for measuring vertical zero clearing error of workbench

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Embodiment Construction

[0040] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0041] refer to figure 1 , figure 1 It is a schematic diagram of the structure of the workbench equipment in the prior art. When measuring the vertical zeroing error of the workbench 13 through the vertical measuring device 11 provided on the main substrate 14, the vertical measuring device 11 is generally arranged on the projection objective lens 12 Close to the edge of one side of the workbench 13, specifically, the light emitter 111 and the light receiver 112 of the vertical measuring device 11 are respectivel...

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Abstract

The invention discloses workbench equipment and a method for measuring vertical zero clearing error of a workbench. The workbench equipment comprises a projection objective lens, a main substrate, a workbench, a controller and at least two vertical measuring devices. Each vertical measuring device comprises a light emitter and a light receiver which are correspondingly arranged, and is arranged onone side, close to the workbench, of the main substrate; in a plane perpendicular to the main substrate, the light emitter and the light receiver which are correspondingly arranged are both arrangedon the same side of the immersion head of the projection objective; the light receivers receive measurement light emitted by the corresponding light emitters and reflected by the first measurement point or the second measurement point on the workbench; and the controller obtains the vertical zero clearing error of the workbench according to the vertical heights of the first measuring point and thesecond measuring point. The invention provides the workbench equipment and the method for measuring the vertical zero clearing error of the workbench, and aims to solve the problem that one set of interferometer system cannot cover the whole stroke of the workbench when the vertical zero clearing error is measured.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a workbench device and a method for measuring the vertical zeroing error of the workbench. Background technique [0002] During the operation of semiconductor equipment, it is often necessary to measure and calibrate the random error of the equipment itself online through the actuators of several sensors, so as to improve the working positioning accuracy of semiconductor equipment. [0003] For example, for workbench equipment, the workbench carries silicon wafers or glass substrates to move in the horizontal or vertical direction, so as to process or transport the silicon wafers or glass substrates on the workbench. position to measure. The vertical interferometer in the interferometer system is used to determine the vertical zero position of the worktable, so as to move the worktable to the vertical zero position, but in the process of zeroing the position ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/00G01B11/06
CPCG01B11/002G01B11/0608
Inventor 徐亚磊张建新
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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