Deep purification and impurity removal process for cobalt chloride solution

A technology of deep purification and cobalt chloride, which is applied in the direction of improving process efficiency, etc., can solve the problems of the impact of impurity content, the impact of extraction and impurity removal process, and the enrichment of copper and cadmium in cobalt chloride solution, so as to achieve simple process flow, The effect of reducing product quality and high depth of impurity removal

Pending Publication Date: 2021-12-17
TIANJIN MAOLIAN SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The problems existing in the production of cobalt chloride products by adopting the above process flow: 1. In the process of extracting and removing impurities, cadmium is not completely separated from cobalt due to the extraction rate, resulting in the enrichment of copper and cadmium in the cobalt chloride solution after P507 stripping; 2. Single Relying on extraction and removal of impurities is greatly affected by the impurity content of the raw material itself, which is not conducive to the long-term stable control of the extraction process; 3. Other external factors, such as the impurity index required by the customer and the level of personnel operation, etc., will affect the existing extraction and removal process. The impact is large, and the impurity content cannot be adjusted quickly

Method used

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  • Deep purification and impurity removal process for cobalt chloride solution

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Embodiment 1

[0011] The invention provides a deep purification and impurity removal process for cobalt chloride solution, which is characterized in that it includes a P507 stripping liquid storage tank, a degreaser, a resin tower, a washing liquid sinking tank, a P507 stripping liquid delivery pump, an oil removal Rear liquid delivery pump, washing liquid low tank, washing water delivery pump, the right end of the P507 stripping solution storage tank is connected with a P507 stripping solution delivery pump, and the right end of the P507 stripping solution delivery pump is connected with a degreasing The right end of the degreaser is connected with a liquid delivery pump after degreasing, and the right end of the degreasing liquid delivery pump is connected with a resin tower, and the right end of the resin tower is connected with a washing liquid low tank, and the washing liquid The right end of the water liquid low level tank is connected with a washing liquid delivery pump, and the right...

Embodiment 2

[0013] When the present invention is in use, as figure 1 As shown, the P507 stripping solution is pumped from the P507 stripping solution storage tank into the degreaser, after being treated by the degreaser, and then pumped into the lower part of the resin tower (resin has been activated) by the deoiled liquid delivery pump, the adsorbed liquid is from The upper end flows out to the evaporation and crystallization process. After the resin in the resin tower is saturated, open the liquid discharge valve at the lower end of the resin tower to drain the cobalt chloride solution in the tower. After the cobalt chloride solution is drained, pure water is pumped into the resin tower with 4BV Wash the resin in the resin tower at a flow rate of / h for 30 minutes, and discharge the washing water into the lower tank of the washing liquid (the resin is washed with pure water for multiple times and reused, and when the utilization rate of the resin is lower than 80%, it is activated once w...

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Abstract

The invention provides a deep purification and impurity removal process for a cobalt chloride solution. The deep purification and impurity removal process is characterized in that the deep purification and impurity removal process comprises a P507 strip liquor storage tank, an oil remover, a resin tower, a washing liquid precipitation tank, a P507 strip liquor delivery pump, an oil-removed liquor delivery pump, a washing liquid low-position tank and a washing liquid delivery pump. According to the deep purification and impurity removal process, D201-III resin is adopted to conduct deep impurity removal on P507 reverse extraction cobalt chloride, the technological process is simple, automatic operation can be achieved, the impurity removal depth is high, the impurity content of the liquid before crystallization is smaller than 0.2 mg / L, impurities include Cd, Cu and the like, the cobalt-impurity ratio of the liquid after impurity removal is 600000-750000: 1, and the impurity content of cobalt chloride produced through crystallization is lower than 2 ppm; and meanwhile, a resin adsorption deep purification link is added, which is equivalent to an additional insurance, so that the error-tolerant rate of the process operation is increased, and the influence of impurity content fluctuation of the front-end cobalt chloride solution on the product quality is reduced.

Description

technical field [0001] The invention relates to the technical field of purification technology in the cobalt hydrometallurgy industry, in particular to a deep purification and impurity removal process for cobalt chloride solution. Background technique [0002] Raw materials containing copper and cobalt are leached into the solution with valuable metals such as Cu and Co in the sulfuric acid system. The solution is initially purified by the front-end process to remove impurities such as Fe, Cu and Al to obtain a cobalt sulfate solution. The cobalt sulfate solution is removed through the cobalt extraction process. Mn, Ca, Zn and other impurities to obtain cobalt chloride solution. Cobalt chloride solution generally produces cobalt chloride products by evaporation and crystallization; [0003] The problems existing in the production of cobalt chloride products by adopting the above process flow: 1. In the process of extracting and removing impurities, cadmium is not completely...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22B3/24C22B3/38C22B23/00
CPCC22B3/24C22B23/00Y02P10/20
Inventor 严楼杨杨静宇张旭东陈子昱
Owner TIANJIN MAOLIAN SCI & TECH
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