Method for low-temperature adsorption refining of high-purity and ultra-pure gas

It is an adsorption refining and gas technology, which is applied in the direction of separation methods, gas treatment, chemical instruments and methods, etc. It can solve the problems of low efficiency of adsorbent recycling, difficulty in large-scale continuous production, and long-term heating and cooling, so as to avoid A large amount of energy and material consumption, high recycling efficiency, high purity effect

Active Publication Date: 2022-03-04
SOUTHWEST RES & DESIGN INST OF CHEM IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The principle of this method is simple, but the process is complicated, and frequent heating and cooling switching is required. Not only the liquid nitrogen loss is large, but also the heating and cooling takes a long time, the recycling efficiency of the adsorbent is low, the economic benefit is poor, and it is difficult to mass-produce continuously

Method used

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  • Method for low-temperature adsorption refining of high-purity and ultra-pure gas
  • Method for low-temperature adsorption refining of high-purity and ultra-pure gas
  • Method for low-temperature adsorption refining of high-purity and ultra-pure gas

Examples

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Embodiment 1

[0050] The method for the low-temperature adsorption and purification of ultrapure gas in this embodiment, the process flow chart is shown in figure 1 , the specific method steps are as follows:

[0051] The raw material gas mainly consists of helium, whose volume content of helium is 99%, the volume content of nitrogen is 1%, the gauge pressure is 1.0MPa, and the temperature is normal temperature. First, it is cooled to about -180°C by a cooler, and then enters a low-temperature adsorption device including two adsorbers. The adsorbent filled in the adsorber is activated carbon, and the adsorber is always immersed in a liquid nitrogen container. When regenerating, there is no need to remove the liquid The nitrogen container does not need to remove liquid nitrogen, nor does it need to add materials and energy to heat up the adsorber.

[0052] Taking adsorber A as an example, when adsorber A is adsorbing, open the valves KV-1A and KV-3A, and the cooled raw gas enters the adsorb...

Embodiment 2

[0059] The method for low-temperature adsorption and purification of high-purity gas in this embodiment, the process flow chart is shown in figure 2 , the specific method steps are as follows:

[0060] The hydrogen-based raw material gas has a volume content of hydrogen of 95%, a volume content of nitrogen of 5%, a gauge pressure of 1.0 MPa, and a temperature of normal temperature. First, it is cooled to about -180°C by a cooler, and then enters a low-temperature adsorption device including two adsorbers. The adsorbent filled in the adsorber is 5A molecular sieve, and the adsorber is always immersed in a liquid nitrogen container. It does not need to be removed during regeneration. The liquid nitrogen container does not need to remove the liquid nitrogen, nor does it need to add materials and energy to increase the temperature of the adsorber.

[0061] Take the adsorber A as an example, when the adsorber A is adsorbing, open the valves KV-1A and KV-3A, the cooled raw materia...

Embodiment 3

[0068] The method for low-temperature adsorption and purification of high-purity gas in this embodiment, the process flow chart is shown in image 3 , the specific method steps are as follows:

[0069] The raw material gas mainly consists of helium, whose volume content of helium is 99%, the volume content of nitrogen is 1%, the gauge pressure is 1.0MPa, and the temperature is normal temperature. First, it is cooled to about -180°C by a cooler, and then enters a low-temperature adsorption device including two adsorbers, and the adsorbent filled in the adsorbers is activated carbon.

[0070] Taking adsorber A as an example, when adsorber A is adsorbing, the liquid nitrogen jacket outside the adsorber is filled with liquid nitrogen, and the valves KV-1A and KV-3A are opened, and the cooled raw material gas enters the adsorption from the bottom of adsorber A. device. During regeneration, the temperature of the adsorber is at room temperature. During adsorption, the temperature ...

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Abstract

The invention discloses a method for low-temperature adsorption and refining of high-purity and ultra-pure gas, which comprises the following steps: adsorbing and removing impurity gas in raw material gas at low temperature, preparing high-purity and ultra-pure product gas with the purity of higher than 99.99%, vacuumizing an adsorber by using a vacuum pump during regeneration, and feeding the high-purity and ultra-pure product gas into the adsorber while vacuumizing, thereby obtaining the high-purity and ultra-pure product gas with the purity of higher than 99.99%. A small amount of gas with low impurity component content is introduced into the adsorber to regenerate the adsorbent, and the temperature of the adsorber is not obviously increased during regeneration. According to the low-temperature adsorption method, the adsorber does not need to be deliberately heated in the regeneration process, consumption of a large amount of energy and materials caused by frequent heating and cooling of the adsorber is avoided, and the low-temperature adsorption method has the advantages that operation is easy, energy consumption is low, and the device is suitable for long-time continuous operation.

Description

technical field [0001] The invention belongs to the field of gas separation, in particular to a method for refining high-purity and ultra-pure gas by low-temperature adsorption. Background technique [0002] High-purity and ultra-pure gases are widely used in the electronics industry, petrochemical industry, metal smelting, advanced defense, and scientific research. Taking high-purity electronic gases as an example, the market size in 2019 reached 9.2 billion yuan. The technical barriers to the production of high-purity and ultra-pure gases are high, and European and American countries have imposed technical blockades on some key products. Therefore, my country's market demand has always been extremely dependent on imports. [0003] At present, domestic production of high-purity and ultra-pure gases is mainly rectification. Rectification is a mature process, but it consumes a lot of energy and is not suitable for separating gas components with similar boiling points. As a w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/02
CPCB01D53/02B01D2259/40086
Inventor 李旭陶宇鹏王键张宏宇张剑锋杨云伍毅鲁德华潘锋姚中华刘照利
Owner SOUTHWEST RES & DESIGN INST OF CHEM IND
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