Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Plane arrangement structure of shield muck comprehensive utilization system

A technology of plane layout and slag, applied in chemical instruments and methods, water/sludge/sewage treatment, flocculation/sedimentation water/sewage treatment, etc., can solve problems such as unreasonable layout of shield slag treatment sites, To achieve the effect of reducing the amount of secondary handling, reducing efflux, and reducing potential safety hazards

Pending Publication Date: 2022-07-01
CHINA RAILWEY ENG SERVICE CO LTD
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the unreasonable plane layout of the shield muck treatment site in the prior art, the present invention provides a plane layout structure of the shield muck comprehensive utilization system. At the same time of rapid processing, it realizes the reduced transportation, environmental protection treatment and resource utilization of shield dregs, improves the treatment efficiency, and ensures safe and civilized construction

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Plane arrangement structure of shield muck comprehensive utilization system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] In order to make the purposes, technical solutions and advantages of the embodiments of the present application more clear, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only It is a part of the embodiments of the present application, but not all of the embodiments. The components of the embodiments of the present application generally described and illustrated in the drawings herein may be arranged and designed in a variety of different configurations. Thus, the following detailed description of the embodiments of the application provided in the accompanying drawings is not intended to limit the scope of the application as claimed, but is merely representative of selected embodiments of the application. Based on the embodiments of the present application, all other embo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of shield muck environment-friendly treatment, particularly relates to a plane arrangement structure of a shield muck comprehensive utilization system, and solves the problem of unreasonable plane arrangement of a shield muck treatment site in the prior art. The system comprises a production area and a supporting facility area, a passage road (21) is arranged around the production area, the supporting facility area is located on the outer side of the passage road (21), the production area comprises a storage pool arrangement area, an equipment arrangement area and a product stacking area, and the storage pool arrangement area and the product stacking area are located on the two sides of the equipment arrangement area respectively. A feeding module (2), a screening module (3), a sand washing module (4), a flocculation module (5) and a filter pressing module (6) which are connected in sequence are arranged in the equipment arrangement area. According to the invention, outward transportation of materials is facilitated, potential safety hazards are reduced, the passing efficiency of transport vehicles in a production area is improved, and the method is suitable for plane arrangement of shield muck treatment projects.

Description

technical field [0001] The invention belongs to the technical field of environmental protection treatment of shield slag, and in particular relates to a plane layout structure of a comprehensive utilization system of shield slag. Background technique [0002] At present, the construction of underground space in China is in full swing. The shield tunneling method is widely used due to its advantages such as good construction safety, high driving efficiency, low driving cost, wide applicable strata, little impact on ground traffic and facilities, and construction is not affected by climatic conditions. . [0003] In the process of earth pressure shield tunneling, due to the reasons such as the formation of water content and the improvement of the slag during the excavation process, the output slag has a high water content and even is in a semi-fluid state. At present, most of the treatment methods of shield muck are direct outbound transportation for yard treatment. The high ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B09B3/30B09B5/00C02F1/00C02F1/52
CPCB09B3/00B09B5/00C02F1/001C02F1/52
Inventor 刘光鑫高旭东任阳任治承姜世霖杨雯雯郑军侯海燕
Owner CHINA RAILWEY ENG SERVICE CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com