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System and method for contact immersion lithography

A technology of photoresist and light source, applied in the field of systems and methods for contact immersion lithography, capable of solving problems such as process failure

Pending Publication Date: 2022-08-05
WAYMO LLC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, if the photoresist sticks to the mask, the process may fail

Method used

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  • System and method for contact immersion lithography
  • System and method for contact immersion lithography
  • System and method for contact immersion lithography

Examples

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Embodiment Construction

[0020] Example methods, devices, and systems are described herein. It should be understood that the words "example" and "exemplary" are used herein to mean "serving as an example, instance, or illustration." Any embodiment or feature described herein as an "exemplary" or "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments or features. Other embodiments may be utilized, and other changes may be made, without departing from the scope of the subject matter presented herein.

[0021] Accordingly, the embodiments described herein are not meant to be limiting. Aspects of the present disclosure as generally described herein and illustrated in the accompanying drawings may be arranged, substituted, combined, separated, and designed in a wide variety of different configurations, all of which are contemplated herein.

[0022] Furthermore, unless context dictates otherwise, the features shown in each figure may be used in combination with ...

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Abstract

The invention relates to a contact immersion lithography exposure unit and a method of using the same. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material at least on the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material through a gap comprising a fluid material. The contact exposure unit further includes an inflatable balloon configured to controllably inflate to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS [0002] This application claims the benefit of US Patent Application Serial No. 16 / 724,925, filed on December 23, 2019, the contents of which are incorporated herein by reference. Background technique [0003] The fabrication of various optical components, such as light guides and other optical devices, can be performed with oblique contact immersion lithography. In this scenario, the realization of sharp corners / edges in the photoresist is beneficial to achieve high optical transmission efficiency of the waveguide structure. However, in order to achieve sharp corners / edges, the substrate / resist is usually placed very close to the photomask. However, the substrate does not directly contact the mask in order to avoid sticking of the photoresist to the mask. For example, if the photoresist sticks to the mask, the process may fail. Therefore, there is a need for a way to controllably adjust the gap between the substrate / resist an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70341G03F7/7035G03F7/70925
Inventor H.石Y-J.董J.邓菲C.根索利
Owner WAYMO LLC