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Positive type radiosensitive composition and method for forming pattern

A sensitivity and composition technology, which is applied in the field of positive radiation-sensitive compositions, can solve the problems of limited types of monomers or polymers, and achieve superior resolution and reduce waveguide loss.

Inactive Publication Date: 2004-06-23
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the types of monomers or polymers that can be used in the techniques described in these gazettes are limited

Method used

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  • Positive type radiosensitive composition and method for forming pattern
  • Positive type radiosensitive composition and method for forming pattern
  • Positive type radiosensitive composition and method for forming pattern

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0257] The composition B for forming an optical waveguide was applied on the surface of the silicon substrate with a spinner, dried at 80° C. for 10 minutes, and then heated at 200° C. for 1 hour to form a lower cladding layer with a thickness of 10 μm. The lower cladding layer has a refractive index of 1.4628 at a wavelength of 1550 nm.

[0258] Next, apply the composition A for forming an optical waveguide on the lower cladding layer with a spin coater, and dry it at 80°C for 3 minutes. Wavelength 365nm, Illumination 200mW / cm 2 Exposure to UV light for 5 seconds. Next, the coating film irradiated with radiation was heated at 100° C. for 2 minutes. Then, this board|substrate was immersed in the developing solution which consists of 1.8 weight% tetramethylammonium hydroxide aqueous solution (TMAH), and the exposure part was melt|dissolved. Thereafter, heating was performed at 200° C. for 1 hour to form a core portion with a thickness of 7 μm. The refractive index of light ...

Embodiment 2

[0262] The composition D for forming an optical waveguide was applied on the surface of the silicon substrate with a spinner, dried at 80° C. for 10 minutes, and then heated at 200° C. for 1 hour to form a lower cladding layer with a thickness of 10 μm. The lower cladding layer has a light refractive index of 1.5236 at a wavelength of 1550 nm.

[0263] Next, apply the composition C for forming an optical waveguide on the lower cladding layer with a spin coater, dry it at 80°C for 1 minute, and use a photomask engraved with a waveguide pattern with a width of 4 to 20 μm to pass the irradiation wavelength 365nm, illuminance 220mW / cm 2 Exposure to UV light for 5 seconds. Next, the coating film irradiated with radiation was heated at 100° C. for 2 minutes. Thereafter, this substrate was immersed in a developer composed of a 1.8% by weight tetramethylammonium hydroxide aqueous solution (TMAH) to dissolve the exposed portion. Thereafter, heating was performed at 200° C. for 1 hou...

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Abstract

A positive type radiosensitive composition comprising the following components (A) to (C): (A) at least one compound selected from the group consisting of a hydrolyzable silane compound represented by the general formula (1): (R1)pSi(X)4-p (1) wherein R1 represents a non-hydrolyzable organic group having 1 to 12 carbon atoms, X represents a hydrolyzable group, and p represents an integer of 0 to 3, a hydrolyzate thereof and a condensed product therefrom; (B) an agent generating an acid by the irradiation with a light; and (C) a basic compound. The use of the above composition allows the production of a cured product excellent in the precision of a pattern and the like, and the above composition can be used as a material for forming an optical wave guide.

Description

technical field [0001] The present invention relates to a positive tone radiation sensitive composition and a pattern forming method using the composition. More specifically, it relates to a positive-type radiation-sensitive composition capable of obtaining a cured product superior in pattern accuracy, a method for forming a pattern using the composition, and a method for forming an optical waveguide. Background technique [0002] In the past, it was customary to use sol-gel materials for positive photolithography (photolithography) materials, such as those disclosed in Japanese Patent Application Laid-Open No. 10-310642, which have phenolic hydroxyl groups or the hydrogen atoms of their phenolic hydroxyl groups are replaced by certain atoms. Molecular siloxanes. In addition, Japanese Patent Application Laid-Open No. 11-302382 discloses the technique of substituting acid-labile groups for hydrogen atoms of carboxyl groups or hydrogen atoms of carboxyl groups and hydroxyl gr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B6/12G02B6/122G02B6/13G02B6/134G02B6/138G03F7/004G03F7/075
CPCG02B2006/121G02B6/138G03F7/0045G02B6/1221G02B6/13G02B6/122G02B2006/12097G03F7/0755G03F7/0757G02B6/1347G03F7/075
Inventor 玉木研太郎宇高友广西川昭
Owner JSR CORPORATIOON