Unlock instant, AI-driven research and patent intelligence for your innovation.

Characterizing and profiling complex surface structures using scanning interferometry

A technology of interferometry and scanning interference, which can be used in interferometers, measurement devices, optical devices, etc., and can solve problems such as non-establishment

Active Publication Date: 2011-07-13
ZYGO CORPORATION
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Unfortunately, such an assumption may not hold when applied to test objects with thin films due to reflections from the top surface and underlying film / substrate interface

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Characterizing and profiling complex surface structures using scanning interferometry
  • Characterizing and profiling complex surface structures using scanning interferometry
  • Characterizing and profiling complex surface structures using scanning interferometry

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0077] figure 1 A flow diagram is shown that generally describes one embodiment of the invention in which analysis of scanning interferometry data is performed in the spatial frequency domain.

[0078] refer to figure 1 , to measure data from the surface of the test object, an interferometer is used to mechanically, or electro-optically scan the optical path difference (OPD) between the reference and the measurement path, which is directed towards the object surface. The OPD at the start of the scan is a function of the local height of the object surface. During an OPD scan for each of the plurality of camera pixels corresponding to different surface locations of the object surface, the computer records interference intensity signals. Next, after storing the interference intensity signal as a function of OPD scan position for each of the different surface positions, the computer performs a transform (eg, Fourier transform) to generate a frequency domain spectrum of the signa...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A method including comparing information derivable from a scanning interferometry signal for a first surface location of a test object to information corresponding to multiple models of the test objects, wherein the multiple models are parametrized by a series of characteristics for the test object. The information corresponding to the multiple models may include information about at least one amplitude component of a transform (eg. A Fourier transform) of a scanning interferometry signal corresponding to each of the models of the test object. In a second aspect the models correspond to a fixed surface height and they are parametrized by a series of characteristics different from the fixed surface height. In a third aspect the comparing comprises accounting for systematic contributions tothe interferometry signal.

Description

[0001] Cross References to Related Applications [0002] This application claims priority under 35 U.S.C 119(e) to the following U.S. Provisional Patent Application, filed March 6, 2003, and entitled "PROFILING COMPLEX SURFACE STRUCTURES USING HEIGHT SCANNING INTERFEROMETRY (PROFILING COMPLEX SURFACE STRUCTURES USING HEIGHT SCANNING INTERFEROMETRY)" , U.S. Patent Application Serial No. 60 / 452,615; U.S. Serial No. 60 / 452,465, filed March 6, 2003, entitled "PROFILING COMPLEX SURFACESTRUCTURES USING SIGNALS FROM HEIGHTSCANNING INTERFEROMETRY (Profiling of Complex Surface Structures Using Signals from Height Scanning Interferometry)" patent application; and US Patent Application Serial No. 60 / 539,437, filed January 26, 2004, entitled "SURFACE PROFILING USING AN INTERFERENCEPATTER NMATCHING TEMPLATE (Matching Surface Profiles of Templates Using Interference Patterns)." It is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates to...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B9/02G01B11/24G01B11/06
CPCG01B9/02057G01B9/0201G01B9/0209G01B9/02088G01B11/0675G01B2290/70G01B9/02084G01B9/02G01B11/24
Inventor 彼得·J·德格鲁特罗伯特·斯托纳泽维尔·C·德利加
Owner ZYGO CORPORATION
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More