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Lithographic apparatus and device manufacturing method

一种光刻、夹紧装置的技术，应用在半导体/固态器件制造、照相制版工艺曝光装置、微光刻曝光设备等方向，能够解决困难等问题

Active Publication Date: 2010-08-11
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Of course the handling of liquids in wet immersion units presents specific difficulties

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

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Embodiment Construction

[0035] Fig. 1 schematically shows a photodrama device according to one embodiment of the present invention. The unit includes:

[0036] An illumination system (illuminator) IL configured to condition a radiation beam B (eg UV radiation or DUV radiation).

[0037] a support structure (e.g. a mask table) MT configured to hold a patterning member (e.g. a mask) MA and connected to a first positioning device PM configured to precisely position the patterning member according to certain parameters;

[0038] a substrate table (wafer table) WT configured to hold a substrate W (e.g. a resist-coated wafer) and connected to a second positioner PW configured to precisely position the patterning components according to certain parameters;

[0039] A projection system, eg a refractive projection lens system, PS, is configured to project the pattern imparted to the radiation beam B by the patterning member MA onto a target portion C of the substrate W, eg comprising one or more dies.

[00...

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PUM

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Abstract

A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.

Description

technical field [0001] The present invention relates to lithographic apparatus and methods of fabricating devices. Background technique [0002] A lithographic apparatus is an apparatus that projects a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, which may also be referred to as a mask or reticle, may produce a circuit pattern formed in a single layer of the IC. The pattern can be transferred onto a target portion (eg, comprising one or more dies) of a substrate (eg, a silicon wafer). Typically the transfer of the pattern is imaged on a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single wafer contains a grid of adjacent target portions that are patterned one after the other. Known lithographic apparatuses include so-called steppers, in which each target portio...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/7085G03F7/709G03F7/70341G03F7/707G03F7/70808
Inventor P·R·M·亨努斯J·J·S·M·梅坦斯P·J·C·H·斯穆德斯P·斯米特斯
Owner ASML NETHERLANDS BV