Vacuum processing apparatus

A technology for processing equipment and equipment, applied in vacuum evaporation plating, metal material coating process, ion implantation plating, etc., can solve the problems of maintenance and repair of negative effects inside the vacuum chamber, increased stability, etc.

Inactive Publication Date: 2006-08-09
ADVANCED DISPLAY PROCESS ENG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, the lack of stability of the bulky upper cover of the chamber when it is lifted vertically increases and thus adversely affects maintenance and repair of the interior of the vacuum chamber

Method used

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  • Vacuum processing apparatus
  • Vacuum processing apparatus
  • Vacuum processing apparatus

Examples

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no. 1 example

[0063] The vacuum processing apparatus according to this embodiment includes: a load lock chamber; a feed chamber; and one or more process chambers, but for convenience of description, the following description is only for one process chamber. refer to Figure 4 , The vacuum processing equipment 100 according to this embodiment includes: a chamber body 110 ; an upper cover 120 ; a horizontal driving device 140 ; ​​an inner wall structure 150 ; and an inner wall structure lifting device 160 .

[0064] In the vacuum processing apparatus 100 according to the present embodiment, the chamber body 110 generally has a rectangular box shape, and the upper cover 120 is detachably provided on the chamber body 110 to constitute a vacuum chamber. The vacuum chamber is used to process a large-area flat panel display substrate having a rectangular shape therein, and thus generally has a rectangular box shape corresponding to the rectangular substrate. The vacuum chamber is provided with an...

no. 2 example

[0081] The vacuum processing apparatus according to the present embodiment includes: a load lock chamber; a feed chamber; and one or more process chambers, and for convenience of description, the following description is only for one process chamber. refer to Figure 9 , The vacuum processing equipment 200 according to this embodiment includes: a chamber body 210 ; an upper cover 220 ; a horizontal driving device 240 ; an inner wall structure 250 ; and an inner wall structure lifting device 260 .

[0082] In the vacuum processing apparatus 200 according to the present embodiment, the chamber body 210 generally has a rectangular box shape, and the upper cover 220 is detachably provided on the chamber body 210 to constitute a vacuum chamber. The vacuum chamber is used to process a large-area flat panel display substrate having a rectangular shape therein, and thus generally has a rectangular box shape corresponding to the rectangular substrate. The vacuum chamber is provided wi...

no. 3 example

[0100] The vacuum processing apparatus according to this embodiment includes: a load lock chamber; a feed chamber; and one or more process chambers, but for convenience of description, the following description is only for one process chamber. refer to Figure 15 , The vacuum processing equipment 300 according to this embodiment includes: a chamber body 310 ; an upper cover 320 ; a horizontal driving device 340 ; and a sealing device 350 .

[0101] In the vacuum processing apparatus 300 according to the present embodiment, the chamber body 310 generally has a rectangular box shape, and the upper cover 320 is detachably provided on the chamber body 310 to constitute a vacuum chamber. The vacuum chamber is used to process a large-area flat panel display substrate having a rectangular shape therein, and thus generally has a rectangular box shape corresponding to the rectangular substrate. The vacuum chamber is internally provided with an exhaust system (not shown) to establish a...

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Abstract

Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.

Description

technical field [0001] The present invention relates to a vacuum processing apparatus which can perform a desired process on a substrate after establishing a vacuum environment therein. More specifically, the present invention relates to a vacuum processing apparatus in which a vacuum chamber is divided into a chamber body and an upper cover so that the upper cover can be easily opened from and closed to the chamber body. Background technique [0002] Vacuum processing equipment is mainly used in semiconductor manufacturing equipment and flat panel display (FPD) manufacturing equipment. Semiconductor or FPD manufacturing equipment is designed to feed a substrate into the equipment and perform a desired process, such as an etching process, on the substrate using plasma or the like. Here, examples of the FPD include LCDs, PDPs, OLEDs, and the like. refer to figure 1 , Vacuum processing equipment in the prior art generally includes three types of vacuum chambers, namely a lo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00H01L21/20H01L21/3065H01L21/67C23C14/56C23C16/44C23F4/00H01J11/20
CPCA45C11/34A45C13/103
Inventor 李荣钟崔浚泳孙亨圭李祯彬金敬勋金炯寿韩明宇
Owner ADVANCED DISPLAY PROCESS ENG
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