Air float support base for regulating air diaphragm two-way rigidity
A technology of air flotation and support, which is used in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., and can solve problems such as easy wear and tear, affecting the precise control of air supply pressure, and unbalanced air film vacuum.
Active Publication Date: 2006-11-08
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF0 Cites 17 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0004] However, there are still many deficiencies in the double-rigid air bearings that are commonly used now: the outlet holes of compressed gas are mostly made of metal, and as the use time increases, the metal is easy to corrode and wear, which directly affects the pressure on the gas supply. Accurate control; the vacuum gas chamber of the air bearing is small, and it is easy to appear the imbalance of the vacuum degree of the gas film when adjusting the vacuum degree of the gas film, which increases the instability of the air bearing
[0005] Although the currently used air bearing overcomes the contact friction between the silicon wafer stage and the marble platform, due to the above reasons, it is difficult for the air bearing to realize the two-way adjustment of the stiffness of the air film, and it is impossible to ensure that the silicon on the air bearing Tablet precise movement
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0020] see figure 1 , an air bearing for adjusting the two-way stiffness of the gas film, comprising a compressed gas chamber 10 and a vacuum gas chamber 7, wherein the compressed gas chamber 10 has several air outlet holes 9 communicating with the bottom surface of the air bearing, and the vacuum gas chamber There are several air extraction holes 6 communicated with the bottom surface of the air bearing in 7, the air outlet 9 is communicated with the air intake channel 1 on the air bearing, and the air extraction hole 6 is communicated with the air extraction channel 2 on the air bearing; There are several exhaust holes 5 on the bottom surface of the floating support, and the exhaust holes 5 communicate with the exhaust channels 3 on the air floating support. A ruby throttling plug 4 is also set at the vent hole 9. The throttling plug is used to reduce the size of the vent hole and increase the pressure. The ruby throttling plug has the characteristics of wear resistance,...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
This invention relates to a gas floating bearing for adjusting two-way rigid of a gas film including several compressed gas cavities and several vacuum gas cavities, in which, the compressed gas cavity includes an air gate and several vent holes communicating with the bottom of the bearing and the air gate is connected with the inlet channel, the vacuum gas cavity includes a pumping hole communicating with the bottom of the bearing and connected with the pumping channels separately, the bottom of the bearing has vent holes communicating with the vent channel, which uses a technology of controlling gas float by compressed gas and vacuum pump.
Description
technical field [0001] The invention relates to a pneumatic regulating device, in particular to a device for regulating the two-way stiffness of an air film. Background technique [0002] In VLSI optical lithography, the requirements for lithographic precision are getting higher and higher. The horizontal movement of the silicon wafer stage during the photolithography process produces friction between the marble platform and this frictional force causes large errors in the precise movement of the silicon wafer stage. [0003] In order to avoid the decrease of the operation accuracy of the silicon wafer stage caused by the friction between the silicon wafer stage and the marble platform, air bearings are generally used to eliminate this friction force. The silicon chip stand is placed on the air-floating support, and the air-floating support discharges gas through the air outlet, and the air pressure keeps the air-floating support and the Dali platform at a certain distance....
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More IPC IPC(8): G03F7/20H01L21/00
Inventor 李正贤齐芊枫
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD