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Lithographic apparatus and device manufacturing method

A technology of light beams and components, applied in the field of device manufacturing, can solve problems such as leakage or leakage

Active Publication Date: 2009-08-05
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, a sensor such as an interferometer IF for measuring the position of a substrate table supporting a substrate may be affected by the presence of moisture due to the immersion liquid
Furthermore, not all of the above solutions for liquid supply systems are perfect with all immersion liquids involved, leaks or leaks may also occur

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

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Embodiment Construction

[0045] figure 1 A lithographic apparatus according to a specific embodiment of the present invention is schematically represented. The unit includes:

[0046] An illumination system (illuminator) IL for providing a radiation projection beam PB (eg UV radiation).

[0047] A first support structure (e.g. a mask table) MT for supporting a patterning element (e.g. a mask) MA and connected to first positioning means for precisely positioning the patterning element relative to the object PL;

[0048] a substrate table (e.g. wafer table) WT for holding a substrate (e.g. a resist-coated wafer) W and connected to a second positioning device for precise positioning of the substrate relative to the object PL; and

[0049] A projection system (such as a refractive projection lens) PL is used to image the pattern imparted to the projection beam PB by the patterning part MA on a target portion C of the substrate W (such as comprising one or more dies).

[0050] As noted herein, the devi...

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PUM

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Abstract

The present invention discloses a lithographic apparatus in which a liquid supply system provides immersion liquid between the last element of the projection system and the substrate. An active drying station is provided for actively removing immersion fluid from the substrate W or other target after immersing the substrate.

Description

technical field [0001] The invention relates to a photolithography device and a device manufacturing method Background technique [0002] A lithographic apparatus is a device that applies a desired pattern to a target portion of a substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, such as a mask, can be used to create a circuit pattern corresponding to an individual layer of the IC that can be imaged on a substrate (such as a silicon wafer) to which a layer of radiation-sensitive material (resist) has been applied. On the target portion (for example, including a part, one or more dies). Typically, a single wafer will contain a grid of adjacent target portions exposed sequentially. Known lithographic apparatuses comprise so-called steppers, which irradiate each target portion by exposing the entire pattern onto them at once, and known lithographic apparatuses which also comprise s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
CPCB05C9/12G03F7/70341G03F7/2041G03F7/70991H01L21/67034G03F7/70875
Inventor B·斯特里克S·N·L·多德斯E·R·鲁普斯特拉J·C·H·穆肯斯
Owner ASML NETHERLANDS BV