Edge ring assembly with dielectric spacer ring

Abstract

An edge ring assembly surrounds a substrate support surface in a plasma etch chamber. The edge ring assembly includes an edge ring and a dielectric spacer ring. The dielectric spacer ring surrounds the substrate support surface and is surrounded in a radial direction by the edge ring, the dielectric spacer ring being configured to insulate the edge ring from the substrate. Integrating the edge ring assembly around the substrate support surface can reduce polymer buildup on the underside of the substrate and along the edge of the substrate, and can increase plasma etch uniformity of the substrate.

Description

Background technique [0001] In the following description, references are made to certain structures and methods, however, these references should not necessarily be construed as an admission that these structures and methods are limited to prior art under relevant applicable regulations. Applicants reserve the right to demonstrate that any referenced subject matter does not constitute prior art. [0002] In the field of semiconductor processing, plasma processing chambers are typically used to etch one or more layers formed on a substrate. During etching, the substrate is supported on the surface of the substrate support within the chamber. The substrate support may include an edge ring disposed around the substrate support (i.e., around the substrate) to confine the plasma to the volume above the substrate, and / or to protect the substrate support ( It usually includes a clamping mechanism) to protect against plasma erosion. The edge ring (sometimes called the focus ring) m...

AI Technical Summary

Problems solved by technology

Bevel polymers that can volatilize during subsequent processing, which can have a negative impact on processing yield

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