Stepping type non-mask digital exposure device based on digital micro-lens array

Abstract

The invention discloses a stepping-type non-mask digital exposure device based on the digital micro-mirror array, which can utilize the method of replacing digital micro-mirror array by a traditional mask plate and combine the characteristics of a projecting exposure system to realize the system digital flexible exposure; patterns and images to be exposed are sent to the digital micro-mirror array by a computer to form a digital mask; then illuminating light treated by homogenization and collimation irradiates the digital micro-mirror array, and the illuminating light is treated by the spatial light modulation by the mask images on the digital micro-mirror array; the patterns and the images on the digital mask plate are copied to a photo-etching sample by a projection objective system; the photo-etching sample is arranged on a high-precision X-Y direction movable work-piece table and steps by the work-piece table; the patterns of all exposure sub-fields are orderly formed on the focal plane by the digital micro-mirror, and are jointed to obtain an exposure image or pattern with larger area. The device has strong technological extensibility and technique compatibility, and is easy to apply to the common engineering practices.

Description

technical field [0001] The invention relates to a maskless digital exposure device, in particular to a step-by-step maskless digital exposure device based on a digital micromirror array. technical background [0002] Original lithography equipment such as: proximity X-ray lithography, extreme ultraviolet projection lithography, electron beam projection lithography, electron beam direct writing, ion projection lithography, immersion optical projection lithography, nanoimprint lithography, etc. The equipment needs to use a mask in lithography, and the traditional mask is easy to be damaged and scratched during use, which affects the exposure quality and production efficiency. Moreover, due to the influence of factors such as expensive mask costs, high exposure device prices, and lack of flexibility, it cannot meet the needs of low-end users such as laboratories for interactive design and flexible processing, thus greatly limiting traditional projection lithography. Scope of a...

AI Technical Summary

Problems solved by technology

Some occasions require lithography technology and equipment with large-area and super-large-area exposure capabilities. Traditional lithography equipment is achieved by increasing the size of the exposure head, but it brings difficulties to uniform illumination and also brings expensive equipment. cost

In addition, in the production and processing of micro-optical elements, for the micro-optical elements with continuous relief surface shape, since its surface shape needs t

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