43results about How to "Increase exposure area" patented technology

A multi-purpose mitt includes microfiber loop chiffons sewn to the front and back portions of a cotton base so that, in general, adjacent edges of the microfiber loop chiffons are approximately 0.5 inch apart from one another. The multi-purpose mitt provides increased microfiber loop exposure to an area to be cleaned, and therefore greater capability for accumulating and retaining larger quantities of dirt, dust, pollen and other contaminants. At the same time, the multi-purpose mitt of the present invention with the above described configuration is configured with a microfiber loop density that provides a high degree of water absorbency.

The invention discloses a stepping-type non-mask digital exposure device based on the digital micro-mirror array, which can utilize the method of replacing digital micro-mirror array by a traditional mask plate and combine the characteristics of a projecting exposure system to realize the system digital flexible exposure; patterns and images to be exposed are sent to the digital micro-mirror array by a computer to form a digital mask; then illuminating light treated by homogenization and collimation irradiates the digital micro-mirror array, and the illuminating light is treated by the spatial light modulation by the mask images on the digital micro-mirror array; the patterns and the images on the digital mask plate are copied to a photo-etching sample by a projection objective system; the photo-etching sample is arranged on a high-precision X-Y direction movable work-piece table and steps by the work-piece table; the patterns of all exposure sub-fields are orderly formed on the focal plane by the digital micro-mirror, and are jointed to obtain an exposure image or pattern with larger area. The device has strong technological extensibility and technique compatibility, and is easy to apply to the common engineering practices.

The invention discloses a method for separating high-purity circulating tumor cells from blood, comprising the following steps of: A. loading single chain polynucleotides on the surface of a micro channel of a micro fluidic chip, and enabling the surface of the micro channel to load an antibody by performing specific binding on polynucleotides and mark single chain polynucleotide in an antibody-mark single chain polynucleotide compound; B. contacting a blood sample with the antibody loaded on the surface of the micro channel of the micro fluidic chip, and separating the circulating tumor cells from blood by the combination of the antibody with surface specific antigens of the circulating tumor cells in the blood; and C. implementing release of the antibody and the captured circulating tumor cells from the surface of the micro channel by cutting a polynucleotide chain, thereby separating to obtain the high purity circulating tumor cells. The method provided by the invention can separate the high purity circulating tumor cells. If the released cells further pass through the loaded chip aiming at hemameba, the circulating tumor cells with sky-high purity can be obtained.

The invention provides an optical system of a large-field splicing exposure machine. The system is characterized in that a digital graph output by a signal source is transversely and longitudinally segmented, images of each sub-field are respectively transmitted to four LCOS (Liquid Crystal on Silicon) systems with the same specification, and each LCOS is spliced into an image which is the same as the original field after passing through a polarization beam splitter and two total reflection prisms, namely the total resolution is expanded to be four times of that of the original chip. The system can effectively solve the problem that the field of a traditional exposure machine is limited by the size of the chip and large-amplitude exposure cannot be performed.

A back-illuminated image sensor and a forming method thereof are provided, the forming method comprising: providing a semiconductor substrate, the semiconductor substrate including a first side and asecond side opposite to the first side, wherein a plurality of discrete photosensitive regions are formed in the semiconductor substrate on the first side, the photosensitive regions being adapted tosense light incident from the second side; Forming a first dielectric layer on a second side surface of the semiconductor substrate; Forming a transparent color filter layer correspondingly on the surface of the first dielectric layer above the partial number of photosensitive regions; Forming a light-absorbing material layer covering surfaces of the transparent color filter layer and the first dielectric layer; Etching the light-absorbing material layer without a mask to form an opaque sidewall on the sidewall surface of the transparent color filter layer; a color filter layer is formed on the surface of the first dielectric layer between the transparent filter layers. The back-illuminated image sensor formed by the method of the invention improves the performance of anti-crosstalk, and has the advantages of simple process and high integration level.

The process and apparatus of the present invention is directed to an auger system that continuously sanitizes transported food products prior to processing and consumption. The auger system is designed to increase and enhance the surface and sub-surface area exposure of a transported food product to a liquid and/or gaseous sanitizing material. The auger system includes specialized flights and attachments for the agitation and/or turning of the transported food product to affect the sanitizing process by exposing a substantial portion of the surface of the transported food product to the liquid and/or gaseous sanitizing material.

The invention relates to the technical field of optical films, in particular to a preparation method of a brightened optical film. The preparation method is characterized by comprising the following technological steps: stretching a raw coiled material driven by a motor to operate, stripping a protective film to expose a substrate, sending the substrate to a scraper-type coater to coat an opticalfilm material; then, carrying out infrared predrying in a dryer with an additional infrared lamp under the conditions that the infrared illumination power is 1000 mJ, the predrying time is 5-10s, andthe ventilation rate in drying is 30m<3>/min; adopting a rubber embossing roller to emboss in an embossing device, adopting a UV lamp with the power of 600-800 mJ to dry and shape; pasting a transparent protective film; and coiling. Compared with the prior art, the invention has strong suitability by adopting a cutting tool of the scraper-type coater, greatly improves the product-curing effect because a large wrapping angle is formed between the substrate and the output end of the embossing roller and saves energy; embossing and UV shaping are simultaneously carried out so that patterns on the substrate surface are difficult to deform.

An exposure apparatus includes a pattern generator with light switches arrayed on a plane parallel to a surface of an object to be exposed. Each of the light switches has a switching element that is a rectangular pillar of an electro-optic crystal, and a pair of polarizers arranged on respective sides in the long axis direction of the switching element. The exposure apparatus drives the light switches individually to generate an exposure pattern having a certain bright and dark form and irradiate the object to be exposed with the pattern. Furthermore, the exposure apparatus has a plurality of microlenses provided on the light-output side of the pattern generator so that the optical axes of the microlenses are aligned to the longitudinal center axes of the switching elements, so as to project images of light-output ends of the switching elements at reduced size onto the object to be exposed.

The embodiment of the invention provides a display module and display equipment. The display module comprises a substrate, a first metal layer, a photoresist auxiliary elimination layer and a packaging layer. When the display module is in use, the photoresist auxiliary elimination layer is additionally arranged on one side, far away from the substrate, of the first metal layer, so the slope of the inclined surface of the packaging groove formed in the first metal layer can be slowed down in an auxiliary manner, and flowability of photoresist on the inclined surface is weakened. In addition, by slowing down the gradient of the inclined plane of the packaging groove, the exposure area of the inclined plane can be increased to ensure that the photoresist on the inclined plane is eliminated as far as possible. According to the display module, the photoresist can be prevented from flowing into the packaging groove to generate bubbles in the packaging groove, and when packaging is carried out through the packaging layer, packaging reliability between part of the packaging layer and the packaging groove can be ensured, so packaging reliability of the whole display module is improved.

The invention discloses a hexagonal boron nitride deep ultraviolet photoelectric detector with an embedded MSM structure and a preparation method thereof, and belongs to the technical field of semiconductor photoelectric detection. The hexagonal boron nitride deep ultraviolet photoelectric detector is composed of a c-axis sapphire substrate layer, a hexagonal boron nitride layer, an embedded MSM electrode structure layer and a hexagonal boron nitride cladding from bottom to top, and the embedded MSM electrode structure layer is of an interdigital electrode structure. The MSM electrode is embedded in the hexagonal boron nitride layer, and the hexagonal boron nitride cladding covers the electrode, so that the exposure area is increased equivalently, and the collection range of photon-generated carriers can be increased to the greatest extent; the carrier mobility in the hexagonal boron nitride layer is far higher than the interlayer mobility, so that the embedded MSM structure is beneficial to improving the responsivity and the response speed of the device; and meanwhile, the electrodes are embedded in the hexagonal boron nitride film, so that the electrodes can be prevented from falling off and being stained, and the stability of the device is ensured.

The invention discloses a low-speed motion control method applied to a phase modulation workbench of an LCOS system, which comprises the following steps: carrying out data processing on a large-format processing graph and dividing the large-format processing graph into a plurality of graph blocks, and controlling the workbench to move to a specified position corresponding to a two-dimensional physical coordinate by a motion controller; uploading the graphic block file to an LCOS board card memory, and displaying the graphic block file on an LCOS panel; enabling the motion controller to control a pulse light source switch to form primary exposure; and enabling the workbench to move to a designated position corresponding to the next two-dimensional physical coordinate until the two-dimensional physical coordinate points of the whole large-format processing graph are executed. According to the invention, the characteristics of large pulse laser energy, short pulse width and high repetition frequency are utilized, single-frame polarization pattern recording is realized based on a single pulse, and the advantages of large exposure area, high efficiency and good reliability are realized by accurately controlling the movement of the workbench.

A cold light source exposure machine comprises a support, a slide holder, an exposure mechanism and a vertical adjusting mechanism; the slide holder is horizontally fixed at the lower end of the support; the vertical adjusting mechanism is used for adjusting the height of the exposure mechanism; the exposure mechanism comprises an ultraviolet light source, a polygonal mirror group, a reflector group, a mechanical shutter and a housing; the polygonal mirror group and the reflector group are both arranged in the housing; the polygonal mirror group comprises a plurality of reflectors which are annularly, uniformly and tightly arranged; the ultraviolet lamp source is arranged at the central point of the polygonal mirror group; the reflector group comprises a first reflector and a second reflector; the first reflector and the second reflector are oppositely arranged in parallel and form an included angle of 45 degrees with the horizontal direction; the first reflector is arranged right below the ultraviolet lamp source; the mechanical shutter is transversely arranged between the first reflector and the second reflector; and a collimating mirror is arranged under the second reflector. Accumulation of the thermal area on the slide holder of the exposure machine is avoided, the exposure efficiency is improved, the energy attenuation of ultraviolet light is greatly reduced, and the exposure area is enlarged.