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Plane reflection type compound eye cold light source exposure system

An exposure system and plane reflection technology, which is applied in the field of plane reflection compound eye cold light source exposure system, can solve the problems of poor exposure uniformity and low light energy utilization rate, achieve the effect of expanding the exposure area and improving the diffraction effect of lithography

Inactive Publication Date: 2010-04-07
SHANGHAI XUEZE OPTICAL MECHANICAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The invention solves the problem of low utilization rate of light energy in the short-wavelength ultraviolet light exposure system, and solves the problem of poor exposure uniformity in the large-area exposure system

Method used

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  • Plane reflection type compound eye cold light source exposure system
  • Plane reflection type compound eye cold light source exposure system
  • Plane reflection type compound eye cold light source exposure system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] Such as figure 1 As shown, the flat reflective compound eye cold light source exposure system of this embodiment includes: a light source group 1, a polygonal mirror group device 2, a mirror group, an exposure device, and a casing 5, and the center of the light source of the light source group 1 is placed on the polygonal mirror The central point of the group device 2, the mirror group and the exposure device are placed in the casing 5;

[0040] Such as figure 2 As shown, the lamp source group 1 includes an ultra-high pressure mercury lamp 11 and an ultra-high pressure mercury lamp frame 12, and the ultra-high pressure mercury lamp 11 is fixed on the ultra-high pressure mercury lamp frame 12;

[0041] The multi-faceted mirror group device 2 includes an upper mirror base 21 and a lower mirror base 22, the upper mirror base 21 is closely stacked on the lower mirror base 22,

[0042] Such as image 3 As shown, the upper lens holder 21 includes an upper plate 211, an up...

Embodiment 2

[0066] The lithography machine of this embodiment mainly includes an exposure light source, a microscope for separating the field of view, a precision workbench, a mechanism for conveying silicon wafers, and a PLC controller. exposure system.

[0067] The distance between the working exposure surface (that is, the position of the mask and the silicon wafer) and the top of the collimating mirror is 100mm.

[0068] When exposing (that is, during photolithography), 64 point light sources work at the same time, irradiating the mask and the silicon wafer at different angles at the same time, and the obtained diffraction pattern is uniform.

[0069] The planar reflective compound eye cold light source exposure system has been successfully applied in the lithography machine, and the exposure energy has reached 18mw / cm 2 , and successfully developed a separate field of view microscope, the maximum split viewing distance reached 100mm.

[0070] Compared with the prior art, this embod...

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Abstract

A plane reflection type compound eye cold light source exposure system belongs to the photo etching technical field, which comprises a lamp source group, a polygonal mirror group device, a reflector group and an exposure device. The plane reflection type compound eye cold light source exposure system is characterized in that the polygonal mirror group device comprises an upper lens mount and a lower lens mount, wherein the upper lens mount is tightly laminated on the lower lens mount; the upper lens mount comprises an upper disc, an upper lens pressing ring and upper disc reflectors, whereinthe upper lens pressing ring is arranged between the upper disc and the upper disc reflectors, the upper disc reflectors are tightly and annularly arranged in a ring to be arranged in the upper disc,thelower lens mount has a similar structure as the upper lens mount; the reflector group comprises a small reflector group and a large reflector group, wherein the small and the large reflector groups a re parallel and oppositely arranged, having an angle of 45 degrees with the horizontal plane. A photo etching machine is characterized by comprising the plane reflection type compound eye cold light source exposure system. The invention provides a position arrangement of multilayer reflectors, to improve exposure uniformity and expand exposure area.

Description

technical field [0001] The invention relates to an exposure system and a photolithography machine in the technical field of photolithography, in particular to a plane reflection type compound eye cold light source exposure system. Background technique [0002] An important part of the integrated circuit manufacturing process is lithography technology. So far, optical lithography technology still occupies an absolute dominant position in integrated circuit manufacturing. The exposure wavelength is developing towards deep ultraviolet. The deep ultraviolet spectrum of 196 nm has been adopted. The line width has also reached the nanometer level. [0003] In China, close-contact lithography machines still occupy a dominant position, and the quality of exposure technology will directly affect the quality of lithography lines. [0004] At present, the exposure technologies commonly used at home and abroad are: [0005] (1) Multi-lens compound eye exposure system. [0006] Parall...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B27/00G03F7/20
Inventor 张岳方
Owner SHANGHAI XUEZE OPTICAL MECHANICAL
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