Method for manufacturing pixel defining layer structure and OLED device
A pixel definition layer and device technology, which is applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., can solve the problems of poor pixel uniformity of devices, unfavorable OLED devices, and reducing the aperture ratio of devices, so as to avoid open circuits of devices , improve the uniformity and reduce the production cost
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[0023] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0024] combine Figure 3-4 , an embodiment of the present invention provides a method for preparing a pixel defining layer structure, comprising the following steps:
[0025] S01. A TFT backplane 1 is provided, and a negative photoresist layer 2 is coated on the anode 13 of the TFT backplane 1;
[0026] Specifically, in the above step S01 , the TFT backplane 1 includes a TFT array 12 and an anode 13 sequentially stacked on a hard carrier substrate 11 . The TFT backplane 1 can be one of a rigid TFT backplane or a flexible TFT backplane. When a rigid TFT backplane...
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