Arrangement used for manufacturing large area micro-nano structure

Abstract

This invention relates to one large area nanometer structure process device, which mainly comprises the following parts: coherent source, shot, space filter, light grating, sample bench, reflection lens, fine rotation bench, two dimensional mobile bench, local dark chamber and computer control system, wherein the sample bench, reflection lens, fine rotation bench and two dimensional bench are put into local dark chamber; the laser beam is sent from coherent source through shot into space filter to improve the beam even property and then through light grating size and finally onto reflection lens and sample bench; shot is switched and two dimensional mobile bench and fine rotation bench are fulfilled by computer control system.

Description

technical field [0001] The invention relates to a device for making large-area micro-nano structures. Background technique [0002] At present, the technologies used to fabricate micro-nano structures mainly include: optical lithography, electron beam lithography, ion beam lithography, and nanoimprint technology. However, when producing large-area micro-nano structures, for optical lithography, the exposure wavelength of the lithography system is getting shorter and shorter, the numerical aperture of the system is getting bigger and bigger, and the contradiction between resolution and depth of focus is getting more and more prominent. Electron beam lithography and ion beam lithography, although high in resolution, are inefficient and unsuitable for fabricating large-area structures. Although nanoimprint technology has the advantages of high resolution and good repeatability, it encounters great difficulties in the fabrication of large-area nanoimprint templates. The existi...

AI Technical Summary

Problems solved by technology

Electron beam lithography and ion beam lithography, although high in resolution, are inefficient and not suitable for fabricating large-area structures

Although nanoimprint technology has the advantages of high resolution and good repeatability, it encounters great difficulties in the production of large-area nanoimprint templates.

The existing micro-nano processing technology has a series of problems such as high cost, low efficiency, and incapability of large-scale production. The production of large-area micro-nano structures encounters severe challenges. It is urgent to develop other types of low-cost equipment to meet the needs of nano-compounds. Requirements for large-area micro-nano structure fabrication technology in the fields of semiconductor circuits, nano-MEMS, integrated optics, and magnetic information storage

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