Photomask with exposure correction function

Abstract

The invention provides a photomask with an exposure correction function. The photomask comprises a shading region and an exposure region which is surrounded by the shading region, wherein the exposure region comprises a correction subregion and an exposure subregion; and the correction subregion is arranged around an acute angle peak of the exposure subregion. According to the photomask, by setting the compensation sub region around the acute-angle vertex of the exposure subregion, when light passes through the correction subregion, the light is diffracted, so that the diffracted light and the light which is irradiated to a photoresist through the acute angle are intensified mutually, thereby improving the exposure intensity around the acute-angle vertex, so that the effects of improving the exposure capability, obtaining a desired pattern through exposure etching, further enabling the electric field distribution to be even, improving the manufacturing quality of a liquid crystal product, and further improving the display effect of a display are realized.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a photomask with exposure correction. Background technique [0002] Currently, liquid crystal displays have been widely used in electronic display products, such as televisions, computer screens, notebook computers, mobile phones, and the like. [0003] In a liquid crystal display, in order to ensure the deflection angle of the liquid crystal, it is necessary to ensure the strength of the electric field formed in the panel. However, in the wide viewing angle (FFS) display mode, the electric field is distributed laterally, so it is more necessary to ensure the exposure accuracy of the pixel electrodes, so as to obtain a uniform electric field and uniformly deflect the liquid crystal. [0004] In the process of making the mask, when the size of the mask is smaller than the minimum precision of the exposure machine, due to the limitation of exposure precision, the de...

AI Technical Summary

Problems solved by technology

[0004] In the process of making a photomask, when the size on the photomask is smaller than the minimum precision of the exposure machine, due to the limitation of the exposure precision, the designed graphics cannot be completely copied. If it is an acute angle, after the exposure and etching process, the obtained light The graphics on the mask will form rounded corners. If such a mask is used, the electric field will be uneven, which will affect the deflection of the liquid crystal and form a dark band, which will affect the production quality of the product and further affect the display effect of the display.

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