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Light path structure suitable for femtosecond laser two-photon mirco-nano processing system

A micro-nano processing, femtosecond laser technology, applied in optics, optical components, opto-mechanical equipment, etc., can solve the problem of uneven spatial distribution of light intensity

Inactive Publication Date: 2009-06-17
BEIHANG UNIV
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Problems solved by technology

[0004] In order to change the low efficiency of two-photon laser three-dimensional micromachining and the defect of uneven distribution of light intensity in space, the present invention provides an optical path structure suitable for femtosecond laser two-photon micro-nanomachining system. Resolved Diffraction Theory Introduced into Femtosecond Laser Two-Photon Microfabrication

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  • Light path structure suitable for femtosecond laser two-photon mirco-nano processing system
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  • Light path structure suitable for femtosecond laser two-photon mirco-nano processing system

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Embodiment Construction

[0018] The present invention will be further described in detail below in conjunction with the accompanying drawings.

[0019] Referring to Fig. 1, the present invention is an optical path structure applicable to a femtosecond laser two-photon micro-nano processing system. Aperture filter 4, cut-off diaphragm 5, collimating lens 6, aperture diaphragm 7, super-resolution diffractometer 8 and oil immersion objective lens 9 are composed, and the distance between femtosecond two-photon laser 1 and photosensitive resin 10 is centered along the optical axis The sub-arrangement includes an optical gradient attenuator 2, a filtering convex lens 3, a pinhole filter 4, an intercepting diaphragm 5, a collimating lens 6, an aperture diaphragm 7, a super-resolution diffracting device 8, and an oil immersion objective lens 9. The super-resolution diffractometer 8 is installed on the oil immersion objective lens 9 .

[0020] see image 3 As shown, the super-resolution diffraction device 8 ...

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Abstract

The invention discloses a light path structure suitable for a femto-second laser two-photon micro-nano processing system. The light path structure consists of a femto-second two-photon laser, a light gradient attenuator, a filtering convex lens, a pinhole filter, an intercepting diaphragm, a collimating lens, an aperture diaphragm, a super resolution diffractometer and an oil immersion objective. The light gradient attenuator, the filtering convex lens, the pinhole filter, the intercepting diaphragm, the collimating lens, the aperture diaphragm, the super resolution diffractometer and the oil immersion objective are arranged between the femto-second two-photon laser and photosensitive resin in sequence by using an optical axes as the center. The super resolution diffractometer is arranged on the oil immersion objective. The light path structure changes power distribution of femto-second laser in a focus local area by the super resolution diffractometer, so that the light intensity of a side lobe is larger than a two-photon converged power threshold value, thus achieving multi-point processing in two-photon micro-nano processing.

Description

technical field [0001] The invention relates to a femtosecond laser two-photon micro-nano processing system suitable for the preparation of three-dimensional micro-nano structures of various photosensitive resin materials, more particularly, an optical path suitable for a femtosecond laser two-photon micro-nano processing system structure. Background technique [0002] Two-photon laser three-dimensional micromachining uses the nonlinear interaction between laser and processing materials to realize micro-nano processing. Its processing method is the accumulation of massive photopolymerization single points one by one. All structures are formed by two-photon exposure of a little bit, a line and a layer. For the processing of three-dimensional microstructures, it needs to consume a lot of energy. manpower and material resources. True three-dimensional is a unique characteristic of two-photon laser three-dimensional micromachining, but this characteristic also brings some by-p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00G02F1/35G02B27/00
Inventor 魏鹏冯丽爽张春熹
Owner BEIHANG UNIV
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