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Modeling a sector-polarized-illumination source in an optical lithography system

A lithography system and lighting source technology, applied in the field of semiconductor manufacturing and modeling of semiconductor manufacturing process, can solve the problem of damaging the accuracy of OPC/RET model

Active Publication Date: 2010-06-02
SYNOPSYS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because the ideal TE polarized illumination assumed by these OPC / RET models does not mathematically match the physical realization of TE illumination on real scanners, the accuracy of the OPC / RET models for these advanced processes (when using TE polarized illumination) is severely compromised Spend

Method used

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  • Modeling a sector-polarized-illumination source in an optical lithography system
  • Modeling a sector-polarized-illumination source in an optical lithography system
  • Modeling a sector-polarized-illumination source in an optical lithography system

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Embodiment Construction

[0032] The following description is provided to enable one skilled in the art to make and use the invention, and is presented in the context of a particular application and its requirements. Various modifications to the disclosed embodiments will be apparent to those skilled in the art, and the general principles defined herein may be applied to other embodiments and applications without departing from the spirit and scope of the invention. Thus, the present invention is not limited to the illustrated embodiments, but is to be accorded the widest scope consistent with the principles and features disclosed herein.

[0033] The data structures and code described in this detailed description are typically stored on a computer readable storage medium, which may be any device or medium that can store code and / or data usable by a computer system. This includes, but is not limited to, volatile memory, nonvolatile memory, magnetic and optical storage devices such as disk drives, magne...

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Abstract

One embodiment of the present invention provides a system that constructs a source polarization model to simulate a piecewise-constant-linear polarization-configuration of an illumination source in an optical lithography system. During operation, the system starts by partitioning an illumination pupil plane of the illumination source into a set of sectors to match a physical implementation of the illumination source. Next, the system constructs the source polarization model for the illumination source by individually specifying a constant- linear polarization- state within each sector to match the polarization-configuration of the illumination source.

Description

technical field [0001] The present invention generally relates to semiconductor manufacturing and modeling semiconductor manufacturing processes. More specifically, the present invention relates to a method for constructing lithography and optical proximity correction (OPC) models to simulate sector polarized illumination sources in optical lithography systems used in semiconductor manufacturing processes. Background technique [0002] Significant improvements in current semiconductor integrated circuit (IC) technology have made it possible to integrate hundreds of millions of transistors on a single semiconductor IC chip. These improvements in integration density are primarily achieved through corresponding improvements in the semiconductor manufacturing process. Semiconductor manufacturing processes typically include several operations involving complex physical and chemical interactions. Because it is nearly impossible to find precise formulas to predict the behavior of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70441G03F7/70566G03F7/70091G03F7/705
Inventor 张乔林H·宋
Owner SYNOPSYS INC