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Clamping and protecting device for one-sided processing

A protection device, single-sided technology, used in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., to solve problems such as safe clamping

Active Publication Date: 2012-04-18
SHENYANG KINGSEMI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the present invention is to provide a clamping and protecting device for single-sided processing, which solves the problems of correct placement on the device and safe clamping during high-speed rotation when silicon wafers or similar objects are processed on one side

Method used

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  • Clamping and protecting device for one-sided processing
  • Clamping and protecting device for one-sided processing
  • Clamping and protecting device for one-sided processing

Examples

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Embodiment Construction

[0024] Such as figure 1 As shown, the entire device of the present invention includes a rotating disk 11 and a rotating shaft 21. The rotating disk 11 is located above the entire device for placing silicon wafers 30 or discs. The hollow rotating shaft 21 is connected to the bottom of the rotating disk 11. Driven by the motor, the rotating shaft 21 can drive the rotating disk 11 to rotate at a speed of 100-5000 revolutions per minute. There is a cylindrical groove 12 in the center of the upper surface of the rotating disk 11, and the supporting frame 13 is positioned at the peripheral edge of the upper surface of the rotating disk 11, and the silicon wafer 30 is placed on the supporting frame 13, so that the silicon wafer 30 and the rotating disk 11 are both There is a gap between the edges, and the support frame 13 can help guide and hold the silicon wafer 30 in the correct position. The gas nozzle 14 is located on the side wall of the groove 12, the axial direction of the ga...

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PUM

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Abstract

The invention relates to a device mainly used for clamping and protecting a silicon chip and similar substances to perform one-sided processing, in particular to a clamping and protecting device for the one-sided processing, which solves the problems of correctly placing the silicon chip or the similar substances on the device, safely clamping the silicon chip or the similar substances in high-speed rotation, and the like during the one-sided processing. The device is provided with a rotating disc and a rotating shaft, wherein the rotating disc is positioned above the device; the lower side of the rotating disc is connected with the hollow rotating shaft; the center of the upper surface of the rotating disc is provided with a cylindrical concave groove; a supporting frame is positioned atthe periphery of the upper surface of the rotating disc; the silicon chip or disc-shaped objects are arranged on the supporting frame; and gaps are reserved between the silicon chip or the disc-shaped objects and edges of the rotating disc. Gases are ejected from a nozzle of the rotating disc to form a rotating gas flow which forms a pressure condition, so one side of the silicon chip is attachedto the supporting frame of the rotating disc, and the rotating disc and the silicon chip rotate at the same time. The supporting frame of the rotating disc is abutted against the periphery of a roundsilicon chip, and can play a role in simultaneously positioning the silicon chip and the rotating disc.

Description

technical field [0001] The invention relates to a device mainly used for clamping and protecting silicon chips and similar objects for single-side processing, in particular to a clamping and protecting device for single-side processing. Background technique [0002] In the past few years, many remarkable advances have been made in microelectronic integrated circuit manufacturing technology, resulting in the production of more functional and cheaper electronic devices. A major factor driving this progress is new integrated circuit manufacturing equipment and With the invention of corresponding manufacturing technology, the preparation of microelectronic devices usually requires very precise control, very pure materials and a very clean preparation environment, and even the defects produced by submicron particles will lead to the failure of the entire microelectronic device. [0003] Microelectronic devices are generally fabricated on the front side of the silicon wafer, and t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/683
Inventor 陈波陈焱谷德君
Owner SHENYANG KINGSEMI CO LTD
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