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Chemically amplified resist composition and salt employed therein

一种脂肪族烃基、直链状的技术，应用在化学增幅型抗蚀剂组合物及其所使用的盐领域，能够解决曝光强度降低等问题，达到提高分辨率、提高光罩错误增强因子的效果

Inactive Publication Date: 2011-02-09
SUMITOMO CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, shortening the wavelength leads to a decrease in exposure intensity

Method used

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  • Chemically amplified resist composition and salt employed therein
  • Chemically amplified resist composition and salt employed therein
  • Chemically amplified resist composition and salt employed therein

Examples

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Embodiment Construction

[0189] The following examples are given to illustrate the present invention in more detail. The present invention is not limited by the following examples. Of course, appropriate changes can be made within the scope of the above and the following purposes, and these changes are also included in the technical scope of the present invention. Hereinafter, % and parts indicating content or usage are based on mass unless otherwise specified.

[0190] The structure of the compound was confirmed by NMR (EX-270 manufactured by JEOL Ltd.) and mass spectrometry (LC: 1100 manufactured by Agilent, MASS: LC / MSD manufactured by Agilent or LC / MSD TOF).

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Abstract

The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor. By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Z+ represents an organic cation, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group, Ra2 represents a divalent alicyclic hydrocarbon group pr the like, Ra2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Ra3 and Ra4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, Ra5 represents an aliphatic hydrocarbon group, Ra6 represents a divalent aliphatic hydrocarbon group, and Ra7 represents an aliphatic hydrocarbon group.

Description

technical field [0001] The present invention relates to a chemically amplified resist composition and a salt used therefor. Background technique [0002] In the field of semiconductors, microfabrication has been increasingly required, and the wavelength of light sources for exposing photoresists has been shortened. However, shortening the wavelength leads to a decrease in exposure intensity. In order to solve this problem, a chemically amplified resist composition using an acid generator has been developed. The acid generated by the acid generator by light irradiation acts as a catalyst to promote the solubilization reaction (in the case of positive type) and the curing reaction (in the case of negative type), so that the chemically amplified resist composition can realize high sensitivity. As such an acid generator, for example, triphenylsulfonium salt 1-adamantanemethoxycarbonyl difluoromethanesulfonate and the like are known (Example of Patent Document 1). [0003] Pat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/039C07C309/17C07C381/12C07D333/46C07C303/32
CPCC07C381/12C07D307/77G03F7/0045C07D333/46C07C2103/74G03F7/0397C07C2101/14G03F7/0392G03F7/0046C07C309/17C07C2601/14C07C2603/74
Inventor 市川幸司吉田勋山口训史
Owner SUMITOMO CHEM CO LTD
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