Method for obtaining a structure factor of an amorphous material, in particular amorphous glass
A technology of amorphous materials and structure factors, applied in the direction of using wave/particle radiation for material analysis, analyzing materials, measuring devices, etc., can solve problems such as difficult to identify mathematical artifacts
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[0022] figure 1 Example The principle of X-ray scattering used in the method according to the invention. An incident beam 1 of X-photons emitted by a source 11 towards a glass sample 11 is backscattered or reflected by the glass sample.
[0023] A glass sample 10 is placed on the diffractometer 3 . The presence or absence of a post-monochromator can be considered in the configuration of the diffractometer.
[0024] Incident X-rays 1 are reflected by the glass. figure 1 The ray 2 reflected by the sample 10 is depicted. The detector 12 is arranged in the direction of propagation of the reflected ray 2 . This detector 12 makes it possible in particular to measure the intensity of the reflected photons.
[0025] In methods of the WAXS type, the angle of incidence of the emitted X-rays 1 is varied over a relatively large angular range such that the scattering angle θ is varied over a relatively large angular range. The intensity of the reflected photons then varies as a funct...
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