Ion implantation method
An ion implantation and ion technology, applied in the fields of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of waste of adjustment time and difficult adjustment technology.
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[0047] In the present invention, a special dose distribution is implanted on the target, and the special dose distribution can be in various shapes, and of course it can also be flat. A uniform dose distribution has a pattern that is flat. The method used in the present invention determines the scan rate curve according to the ion beam distribution, and rotates the target material under appropriate conditions to achieve the desired effect. In addition, the inclination angle between the target and the vertical axis can be adjusted according to the process requirements to fully control the dose distribution in the device. Its detailed description is as follows, and the preferred embodiments described are only for illustration, not for limiting the present invention.
[0048] Firstly, an ion implantation method according to an embodiment of the present invention is used for implanting ions into a target. The ion implantation method includes: providing an ion beam, wherein the ion...
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