Image display apparatus
An image display device, image area technology, applied in image/graphic display tubes, discharge tubes, screen tubes, etc., can solve problems such as deviation from expectations, image quality degradation easy to expand, image quality degradation, etc.
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example 1
[0065] Made according to the process described below with figure 1 Panels of the configuration shown in . The X direction and Y direction in the following description are figure 1 The X and Y directions are shown in .
[0066] A glass substrate (PD200 manufactured by Asahi Glass Co., Ltd.) having a thickness of 2.8 mm was used as a substrate for the panel 1, and a light-shielding layer (produced by Noritake Kizai Co., Ltd.) was formed on the glass substrate. Manufactured NP-7803D). Next, ribs 7 are formed by photolithography, phosphors 5 for RGB are applied between ribs 7, and phosphors 5 are fired. Subsequently, island-shaped anode layer 6 is formed on phosphor 5 by vacuum evaporation. Finally, the first resistive element 10 and the second resistive element 11 are sequentially formed respectively by photolithography. The pixel pitch is 900 μm, and the width in the X direction of each of RGB is 300 μm. The number of pixels is 100×100 pixels, that is, 300×100 sub-pixels. ...
example 2
[0071] Produced by the following process with Figure 4 Panels of the configuration shown in . The X direction and Y direction in the following description correspond to Figure 4 The X and Y directions are shown in .
[0072]On the surface of a clean glass substrate (PD200 manufactured by Asahi Glass Co., Ltd.) with a thickness of 1.8 mm, a black paste (containing black pigment and glass frit) is screen-printed to form on the substrate A pattern of openings in the form of a matrix. In the opening pattern, the size of each opening is 150 μm (X direction) × 300 μm (Y direction), the X-direction pitch of the openings is 200 μm, the Y-direction pitch of the openings is 600 μm, and the formation of 300 sub-pixels in the X direction and An opening corresponding to 100 sub-pixels in the Y direction. The substrate was dried at 120° C. and then fired at 550° C. to form a black matrix (not shown) with a thickness of 5 μm.
[0073] Next, a plurality of ribs 7 are formed in stripes....
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