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Interference filter, optical module, and analyzing device

An interference filter and analysis device technology, applied in the field of interference filters, can solve the problems of lower reflectivity, performance degradation of interference filters, etc., and achieve the effect of suppressing performance degradation

Inactive Publication Date: 2012-02-08
SEIKO EPSON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] However, even if the Ag-C alloy film described in Patent Document 1 is used as a mirror, the performance of the interference filter is degraded
When an Ag-C alloy film is used for the mirror of an interference filter, although the high temperature resistance and processing resistance are improved compared with the case of using a pure silver film, a decrease in reflectance also occurs

Method used

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  • Interference filter, optical module, and analyzing device
  • Interference filter, optical module, and analyzing device
  • Interference filter, optical module, and analyzing device

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no. 1 approach

[0038] (1. The overall structure of the color measurement device)

[0039] figure 1 It is a diagram showing a schematic configuration of a colorimetric device according to an embodiment of the present invention.

[0040] The colorimetric device 1 is an analysis device of the present invention, such as figure 1 As shown, it includes a light source device 2 that emits light to an object A to be inspected, a colorimetric sensor 3 as an optical module of the present invention, and a control device 4 that controls the overall operation of the colorimetric device 1 . In addition, in this colorimetric device 1, the light emitted from the light source device 2 is reflected by the inspection object A, the reflected inspection object light is received by the colorimetric sensor 3, and the detection signal of the inspection object light is detected based on the detection signal output from the colorimetric sensor 3. Chromaticity is a device for analyzing and measuring the color of the ...

no. 2 approach

[0118] Next, a second embodiment according to the present invention will be described.

[0119] Here, in the description of the second embodiment, the same components as those of the first embodiment are denoted by the same symbols, and the description thereof will be omitted or simplified.

[0120] The second embodiment differs from the etalon 5 of the first embodiment in that the fixed mirror 56 and the movable mirror 57 of the etalon 5A include dielectric films 561 and 571 and alloy films 562 and 572 . The alloy films 562 and 572 are the same as those of the first embodiment.

[0121] Such as Figure 4As shown, on the first substrate 51 , a dielectric film 561 and an alloy film 562 are provided sequentially from the first substrate 51 . That is, the dielectric film 561 is provided between the first substrate 51 and the alloy film 562 . Likewise, on the second substrate 52 , a dielectric film 571 and an alloy film 572 are provided sequentially from the second substrate 52...

no. 3 approach

[0127] Next, a third embodiment according to the present invention will be described.

[0128] Here, in the description of the third embodiment, the same components as those of the first embodiment and the second embodiment are denoted by the same reference numerals, and the description thereof is omitted or simplified.

[0129] The third embodiment differs from the first embodiment in that the fixed mirror 56 and the movable mirror 57 of the etalon 5B include protective films 563 and 573 in addition to the dielectric films 561 and 571 and the alloy films 562 and 572. The etalon 5 of the second embodiment is different from the etalon 5A of the second embodiment. The alloy films 562 and 572 are the same as those of the first embodiment. The dielectric films 561 and 571 are the same as those of the second embodiment.

[0130] Such as Figure 5 As shown, on the first substrate 51 , a dielectric film 561 , an alloy film 562 , and a protective film 563 are sequentially provided ...

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Abstract

An interference filter is provided in which a fixed mirror and a movable mirror of the interference filter are selected from an Ag-Au alloy film, an Ag-Cu alloy film, an Ag-Au-Cu alloy film, an Ag-Si-Cu alloy film, an Ag-P-Cu alloy film, an Ag-P-In-Cu alloy film, an Ag-Te-Cu alloy film, an Ag-Ga-Cu alloy film, and an Ag-In-Sn alloy film.

Description

technical field [0001] The present invention relates to an interference filter, an optical module including the interference filter, and an analysis device including the optical module. Background technique [0002] Conventionally, there is known an interference filter in which mirrors serving as reflective films are arranged to face each other on opposite surfaces of a pair of substrates. Such an interference filter includes a pair of substrates kept parallel to each other, and a pair of reflective mirrors (reflective films) formed on the pair of substrates to face each other with a gap at a certain interval. [0003] In such an interference filter, light is reflected between a pair of mirrors, and only light of a specific wavelength is transmitted, and light of other wavelengths cancels each other by interference, so that only light of a specific wavelength among incident light is transmitted. [0004] A dielectric film or a metal film is used in the mirror. The function...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/28G01J3/02G01J3/46
CPCG02B5/0808G02B5/085G01J3/26G01J3/51G02B5/28
Inventor 新东晋北原浩司
Owner SEIKO EPSON CORP
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