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Developing method and developing device

A developing method and technology of developing equipment are applied in the direction of photosensitive material processing to achieve the effect of overcoming uneven spraying

Inactive Publication Date: 2013-03-20
SICHUAN COC DISPLAY DEVICES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the influence of many factors, there have been more or less problems in the uniformity of developer spraying.

Method used

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  • Developing method and developing device
  • Developing method and developing device

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Embodiment Construction

[0018] It should be noted that, in the case of no conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and examples.

[0019] According to a typical embodiment of the present invention, a developing method is provided to improve the problem of uneven developing. The developing method comprises the steps of: providing a developing device, such as figure 2 As shown, the developing equipment includes a substrate conveying device and a showering device, and the showering device includes a nozzle 10 arranged in parallel, and a nozzle 11 is provided on the nozzle 10; a substrate 20 is provided; and the extending direction of the nozzle 10 arranged in parallel is from The direction perpendicular to the moving direction of the substrate deviates from an included angle of 3° to 5°, so that the developer sprayed by the s...

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Abstract

The invention discloses a developing method and a developing device. The developing method comprises the following steps: providing a developing device which comprises a substrate conveyer and a spray unit, wherein, the spray unit comprises parallelly arranged spray pipes, and the spray pipes are provided with nozzles; providing a substrate; and letting the substrate move in a direction of a 3-5 DEG angle to the vertical line of the axis of the parallelly arranged spray pipes to coat a developing solvent sprayed by the spray unit on the substrate. According to the invention, nozzles are arranged with a small offset instead of a row, so that the problem of nonuniform spraying of the developing solvent caused by mutual interference among the nozzles is solved.

Description

technical field [0001] The invention relates to the field of plasma display screen manufacturing, in particular to a developing method and developing equipment. Background technique [0002] Plasma display is a new type of flat panel display device with self-illumination, light weight, wide viewing angle, thin thickness, full digitalization and good dynamic display effect. [0003] The photoetching process is a very important process step in the production process of the plasma display screen, which mainly includes a photoresist coating step, an exposure step and a development step. Among them, the development is not only restricted by the properties of the sensitizer and the state of the original plate, but also by the development conditions such as the concentration of the developer, temperature, fatigue, and development time. Wherein, the concentration of the developer generally refers to the content of the main developer. Insufficient developer concentration will not o...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/30
Inventor 宋利建吕旭东
Owner SICHUAN COC DISPLAY DEVICES