Pattern forming method and pattern forming apparatus
A pattern and holding device technology, used in power transmission devices, devices for coating liquid on surfaces, and photoengraving processes for patterned surfaces, etc. The effect of stabilization of the start end position and/or end position and suppression of deviations
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
manufacture example
[0029] figure 1 It is a figure which shows one Embodiment of the pattern forming apparatus of this invention. This patterning device 1 can be used, for example, to form a conductive electrode wiring pattern on a substrate W such as a single crystal silicon wafer on which a photoelectric conversion layer is formed to manufacture a photoelectric conversion element used, for example, as a solar cell.
[0030] In this pattern forming apparatus 1 , a stage moving mechanism 2 is provided on a base 101 . The stage 3 holding the substrate W can be moved by the stage moving mechanism 2 figure 1Move within the X-Y plane shown. A bracket 102 is fixed to the base 101 so as to straddle the stage 3 , and the head 5 is attached to the bracket 102 . A syringe pump 52 and a light irradiation unit 53 are attached to the base 51 of the head 5 . A liquid (paste) coating liquid is stored in the internal space of the syringe pump 52 , and the syringe pump 52 discharges the coating liquid onto t...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 