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Pattern forming method and pattern forming apparatus

A pattern and holding device technology, used in power transmission devices, devices for coating liquid on surfaces, and photoengraving processes for patterned surfaces, etc. The effect of stabilization of the start end position and/or end position and suppression of deviations

Inactive Publication Date: 2012-04-18
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] However, in the above technique, depending on the viscosity of the coating liquid, the end of the pattern may sometimes be raised, or conversely the end may be tapered
In addition, there may be a phenomenon in which a thread-shaped and thin coating liquid is pulled out from the coating head separated from the coating object due to the surface tension of the coating liquid (referred to as "smearing" in this specification).
In addition, the timing of starting and ending the spraying of the coating liquid varies due to the viscosity of the coating liquid and the ambient temperature, and is not constant. The position of the starting end or the end portion) changes, and it is difficult to deal with such a situation in the above-mentioned prior art

Method used

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  • Pattern forming method and pattern forming apparatus
  • Pattern forming method and pattern forming apparatus
  • Pattern forming method and pattern forming apparatus

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manufacture example

[0029] figure 1 It is a figure which shows one Embodiment of the pattern forming apparatus of this invention. This patterning device 1 can be used, for example, to form a conductive electrode wiring pattern on a substrate W such as a single crystal silicon wafer on which a photoelectric conversion layer is formed to manufacture a photoelectric conversion element used, for example, as a solar cell.

[0030] In this pattern forming apparatus 1 , a stage moving mechanism 2 is provided on a base 101 . The stage 3 holding the substrate W can be moved by the stage moving mechanism 2 figure 1Move within the X-Y plane shown. A bracket 102 is fixed to the base 101 so as to straddle the stage 3 , and the head 5 is attached to the bracket 102 . A syringe pump 52 and a light irradiation unit 53 are attached to the base 51 of the head 5 . A liquid (paste) coating liquid is stored in the internal space of the syringe pump 52 , and the syringe pump 52 discharges the coating liquid onto t...

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Abstract

In applying an application liquid onto a substrate and forming a line-like pattern, discharging of the application liquid is initiated from an inward position X0 which is inward from an originally intended start position X1, while keeping the amount of the gap between a nozzle and the substrate to a smaller value G0 than the height of the pattern. Following this, the nozzle moves toward outside the substrate while moving away from the substrate, and the reverses its movement direction at the pattern start position X1. Near a posterior end as well, the nozzle moves closer to the substrate while reducing the discharged quantity of the application liquid, and the movement direction is reversed while moving the nozzle away at a pattern end position X3.

Description

technical field [0001] The present invention relates to a pattern forming technique for forming a predetermined pattern on a substrate by applying a coating liquid containing a pattern forming material from a nozzle that moves relative to a substrate surface. Background technique [0002] As a technique for forming a predetermined pattern on a substrate, there is a technique of spraying a coating liquid containing a material for pattern formation from a nozzle that moves relative to the surface of the substrate and coating it on the substrate. In this technology, since the discharge amount of the coating liquid fluctuates immediately after the discharge of the coating liquid starts and immediately before the discharge ends, there is a problem that the coating amount is unstable at the beginning and / or end of the pattern. . [0003] As a technique for solving this problem, for example, the technique described in Patent Document 1 is used. In this technique, in the technique...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B41J2/01B41J25/24
CPCH01L31/18H05K3/1241H01L31/00H05K2203/0126B05C5/0216B05D1/025G03F7/161G03F7/2041H01L21/0274
Inventor 岩岛正信真田雅和古市考次
Owner DAINIPPON SCREEN MTG CO LTD