Fluid bed reactor
A reactor system, heater technology, applied in gaseous chemical plating, semiconductor/solid-state device manufacturing, coating, etc., can solve problems such as fluidized bed pollution
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[0026] Disclosed herein is a fluidized bed for forming polycrystalline silicon by pyrolysis of a silicon-containing gas and deposition of silicon onto fluidized silicon particles or other seed particles (e.g., silicon dioxide, graphite, or quartz particles) Reactor system. A method for operating a fluidized bed reactor system is also disclosed.
[0027] Silicon is deposited on the particles in the reactor by decomposition of a silicon-containing gas selected from: silane (SiH 4 ), disilane (Si 2 h 6 ), advanced silanes (Si n h 2n+2 ), dichlorosilane (SiH 2 Cl 2 ), trichlorosilane (SiHCl 3 ), silicon tetrachloride (SiCl 4 ), dibromosilane (SiH 2 Br 2 ), tribromosilane (SiHBr 3 ), silicon tetrabromide (SiBr 4 ), diiodosilane (SiH 2 I 2 ), triiodosilane (SiHI 3 ), silicon tetraiodide (SiI 4 ), and mixtures thereof. Silicon-containing gases may be mixed with one or more halogen-containing gases, defined as any of the following: Chlorine (Cl 2 ), hydrogen chloride...
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