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Projection objective lens wave aberration detection method based on two-order aberration model

A technology of projection objective lens and detection method, applied in the field of lithography machine, can solve the problems of low measurement accuracy and the like

Active Publication Date: 2014-04-09
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Measurement accuracy is poor when using a linear model for a wide range of wave aberrations

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  • Projection objective lens wave aberration detection method based on two-order aberration model
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  • Projection objective lens wave aberration detection method based on two-order aberration model

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Embodiment Construction

[0053] Below, the present invention will be further described in conjunction with the examples and drawings, but the examples should not limit the protection scope of the present invention.

[0054] For the convenience of describing and highlighting the present invention, relevant components existing in the prior art are omitted from the drawings, and the description of these known components will be omitted.

[0055] figure 1 It is a structural schematic diagram of the wave aberration measurement system of the projection objective lens of the lithography machine of the present invention. The system includes: an illumination source 1 that generates an illumination beam; an illumination system 2 that can adjust the beam waist size, light intensity distribution, partial coherence factor and illumination mode of the illumination beam emitted by the illumination source 1; can carry a test mask 3 and has a precise step mask stage 4 with positioning capability; projection objective...

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Abstract

The invention discloses a projection objective lens wave aberration detection method based on a two-order aberration model. According to the method, a method for analyzing principle components and analyzing multiple linear regression is adopted, so that the two-order relation model is established between space image light intensity distribution and a Zernike coefficient; and a wave aberration value representing the imaging quality of a projection objective lens can be calculated through optimization by using the nonlinear least square method. Compared with a linear relation model based on space image principal component analysis (AMAI-PCA), the projection objective lens wave aberration detection method has the advantages that the amplitude range of aberration measurement is expanded; and when the wave aberration amplitudes are the same, the method is relatively high in measurement precision.

Description

technical field [0001] The invention relates to a photolithography machine, in particular to a method for detecting the wave aberration of a projection objective lens of a photolithography machine based on a second-order aberration model. Background technique [0002] Lithography machine is the most important equipment for manufacturing very large scale integrated circuits. The projection objective lens of the lithography machine is one of the most important systems of the lithography machine, and its performance directly determines the imaging quality of the lithography machine. When the projection objective lens has wave aberration, it will cause the deterioration of lithography imaging quality and the reduction of process window, especially as the feature size of lithography continues to decrease, the impact of projection objective lens wave aberration on lithography imaging quality increasingly prominent. Internationally, a set of orthogonal 37th-order Zernike polynomi...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G01M11/02
Inventor 杨济硕王向朝闫观勇徐东波
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI