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Method for Improving the Uniformity of Corrosion Amount in Each Track of Texturing or Wet Etching Equipment

A technology of wet etching and corrosion amount, applied in chemical instruments and methods, crystal growth, post-processing details, etc., can solve the problems of uneven corrosion amount of each track in texturing and wet etching, and avoid additional costs. Effect

Active Publication Date: 2016-02-10
YINGLI ENERGY CHINA
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AI Technical Summary

Problems solved by technology

[0006] The present invention aims to provide a method for improving the uniformity of corrosion amount of each track of texturing or wet etching equipment, so as to solve the technical problem of uneven corrosion amount of each track of texturing and wet etching in the prior art

Method used

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  • Method for Improving the Uniformity of Corrosion Amount in Each Track of Texturing or Wet Etching Equipment

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Experimental program
Comparison scheme
Effect test

Embodiment approach

[0014] According to a typical implementation of the present invention, the method for improving the uniformity of the corrosion amount of each track of the texturing or wet etching equipment includes the following steps: 1) detecting the corrosion amount of the silicon wafer in each track; 2) adjusting the corrosion amount to be too large or The diameter of the guide wheel on the smaller track can increase or decrease the corrosion amount of the silicon wafer by controlling the depth of the silicon wafer on the guide wheel entering each track in the equipment, and finally make the corrosion amount of the silicon wafer in each channel consistent. As shown in Figure 1, the track 10, the track 20 and the track 30 are part of the track of the texturing or wet etching equipment, for example, the diameter d2 of the guide wheel 21 can be adjusted according to actual needs, so as to achieve the adjustment of the corrosion amount is too large or The small problem keeps the corrosion amo...

Embodiment

[0018] 1. Adjust the parameters of 8 tracks: the exhaust air volume is 35~45m 3 / h, the liquid contains HNO with a mass percentage of 45~60% 3 , the mass percentage is 2~4% HF solution; the temperature is 10~18°C; the transmission speed is 1.2~2.0m / min;

[0019] 2. Detect the corrosion amount of silicon wafers in each track: by testing the weight of silicon wafers before and after corrosion, the corrosion depth of silicon wafers is calculated according to the weight difference through the area and density, and the corrosion depth of each track is calculated by weighing: track Track 1 is 1.3 μm, track 2 is 3.6 μm; track 3 is 3.4 μm; track 4 is 3.5 μm; track 5 is 3.4 μm; track 6 is 3.6 μm; track 7 is 3.5 μm; track 8 is 3.4 μm;

[0020] 3. Adjust the guide wheel diameter of track 1 to reduce by 1~2mm;

[0021] 4. The corrosion amount of the silicon wafer in each track was detected again, and the result showed that the corrosion depth of track 1 became 3.5 μm.

[0022] From the...

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Abstract

The invention discloses a method for improving the corrosion uniformity of all the tracks of texturizing or wet etching equipment. The method comprises the following steps of: 1, detecting the corrosion quantities of silicon wafers in all the tracks; and 2, regulating the diameters of guide wheels on the tracks according to the large or small corrosion quantities, controlling the soaking depths of the silicon wafers on the guide wheels into the liquid medicine in all the tracks of the equipment, thus increasing or reducing the corrosion quantities of the silicon wafers, and finally, enabling the corrosion quantities of the silicon wafers in all the tracks to be consistent. The technical scheme is that the diameters of the guide wheels are respectively regulated, and conveniently solves the defect that the environments of all the tracks are difficult to be completely the same through only regulating the exhaust air art, liquid medicine proportion and liquid medicine flow rate in the prior art, so the corrosion quantities of the silicon wafers of all the tracks are difficult to be controlled to be completely the same; and moreover, the method can also avoid the additional cost which is caused by changing equipment parts, so the saving purpose is realized.

Description

technical field [0001] The invention relates to the field of polycrystalline silicon battery preparation, in particular to a method for improving the uniformity of corrosion amount of each track of texturing or wet etching equipment. Background technique [0002] The main production process of polycrystalline silicon cells is usually: texturing, diffusion, wet etching, PECVD deposition of SiN x , screen printing and sintering. Texturing is the first process of solar cell production. Its main purpose is: 1. Remove the mechanical damage layer on the surface of the silicon wafer; 2. Remove surface oil and metal impurities; The reflectivity, improve the short-circuit current (Isc), and ultimately improve the photoelectric conversion efficiency of the battery. Texturing is mainly through HNO 3 , HF texturing, washing, KOH corrosion, washing, HF, HCl cleaning and other treatments. In this process, the silicon wafer is weighed before and after etching to calculate the etched de...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B33/10C23F1/24
Inventor 范志东赵学玲郭延岭
Owner YINGLI ENERGY CHINA
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