Mask device and manufacturing method thereof
A manufacturing method and mask technology, which are applied to the photoengraving process, optics, instruments and other directions of the pattern surface, can solve the problems of declining product yield, low production efficiency, complicated projective capacitive touch panel process, etc. The effect of reducing defects and improving yield
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[0025] In order to illustrate the mask device provided by the present invention and the manufacturing method thereof, detailed explanations are given below in conjunction with the accompanying drawings.
[0026] see figure 1 , which is a schematic diagram of the mask device provided by the present invention. The mask device 100 is used for shielding the area of the substrate 200 where no protective layer needs to be made during the process of making the protective layer of the panel structure, and the mask device 100 includes a mask module 110, a first driving module 120, and a supporting module 130 and the second driving module 140 . The mask module 110 and the first driving module 120 are respectively located on two sides of a substrate 200 for fabricating a panel structure, and the mask module 110 and the first driving module 120 are disposed opposite to each other. The supporting module 130 includes an adjusting module (not shown in the figure), which is detachably combi...
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