Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Facial mask for removing freckles, acnes and smoothing skin and preparation method of facial mask

A production method and skin rejuvenation technology, which can be used in pharmaceutical formulations, preparations for skin care, cosmetics, etc., and can solve problems such as differences in stability, few varieties, and single effects.

Active Publication Date: 2012-12-26
毛春红
View PDF5 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the selection of materials for the mask, the scientific preparation needs to be further improved, and the effect is single or the stability is quite different, so there are few varieties that are generally liked and accepted by people.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Facial mask for removing freckles, acnes and smoothing skin and preparation method of facial mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] Embodiment 1, prepare raw materials by following component and weight:

[0020] Glycerin 500g Ginkgo 20g Almond 50g

[0021] Coix seed 40g, white peony 40g, yam 30g, japonica rice 40g

[0022] The preparation method of the present invention is as follows:

[0023] After removing the glycerin, each component was washed with water, soaked in water with 6 times the weight of glycerin for 40 minutes, then simmered for 1.5 hours, filtered, and the filtrate was used for later use, then added glycerin and boiled over low heat until the water dried up Divide for storage.

Embodiment 2

[0024] Embodiment 2, prepare raw materials by following component and weight:

[0025] Glycerin 500g Ginkgo 30g Almond 40g

[0026] Coix seed 50g, white peony 20g, yam 40g, japonica rice 50g

[0027] The preparation method of the present invention is as follows:

[0028] After removing the glycerin, each component is washed with water, soaked in water with 5 times the weight of glycerin for 30 minutes, then boiled with a slow fire for 1.5 hours, filtered, and the filtrate is used for later use, then add glycerin and boil over low heat until the water is dry. Divide for storage.

Embodiment 3

[0029] Embodiment 3, prepare raw materials by following component and weight:

[0030] Glycerin 500g Ginkgo 25g Almond 30g

[0031] Yiren 60g, white peony root 30g, yam 20g, japonica rice 60g

[0032] The preparation method of the present invention is as follows:

[0033] After removing the glycerin, each component is washed with water, soaked in water with 4 times the weight of glycerin for 20 minutes, then boiled for 2 hours, filtered, and the filtrate is used for later use, then add glycerin and boil until the water is dry. Divide for storage.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a facial mask for removing wrinkles, freckles, acnes and smoothing skin and a preparation method of the facial mask. The facial mask is characterized by comprising the following components by weight: the weight ratio of glycerol, ginkgo, almond, coix seed, white paeony root, Chinese yam and polished round-grained rice is 500: (20-30): (30-50): (40-60): (20-40): (20-40): (40-60). The facial mask for removing wrinkles, freckles, acnes and smoothing skin and the preparation method of the facial mask have the characteristics of scientific raw materials, easily-obtained materials, good mutual synergistic effect, simple preparation process, stable effect and wide range of applicable people, can be suitable for people with dull-looking skin, freckles, wrinkles, acnes and coarse pores needing to be improved, and have the functions of removing wrinkles, freckles, acnes and whitening and smooth skin.

Description

technical field [0001] The invention relates to a cosmetic and a production method thereof, in particular to a freckle-removing and acne-rejuvenating facial mask and a production method thereof. Background technique [0002] Skin has a great impact on people's image, temperament and mental health. With the change of living environment and the growth of age, human skin will undergo great changes, especially the exposed facial skin. Choose scientific and high-quality Mask to maintain the skin, not only can greatly delay the aging process of the skin, but also can effectively reduce and remove the existing spots, acne and wrinkles, making the skin tender, smooth and elastic. At present, there are many types of skin care masks on the market. A considerable part of the masks often add some chemicals or hormones that have a greater stimulating effect on the skin in order to pursue a single effect. Long-term use can cause telangiectasia, skin shrinkage, and side effects such as sk...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K8/97A61Q19/00A61K8/34
Inventor 毛春红
Owner 毛春红
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com