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Pre-aligning device and pre-aligning method for photoetching device

A lithography equipment and pre-alignment technology, used in microlithography exposure equipment, photolithography process exposure devices, optics, etc. Overcome the effect of pre-alignment accuracy degradation

Active Publication Date: 2013-03-20
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the alignment accuracy of this pre-alignment device is limited by factors such as the energy uniformity of illumination and the accuracy of stability.

Method used

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  • Pre-aligning device and pre-aligning method for photoetching device
  • Pre-aligning device and pre-aligning method for photoetching device
  • Pre-aligning device and pre-aligning method for photoetching device

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Embodiment Construction

[0022] A pre-alignment device and method for lithographic equipment according to a specific embodiment of the present invention will be described in detail below with reference to the accompanying drawings. However, the present invention should be understood as not limited to such embodiments described below, and the technical idea of ​​the present invention can be implemented in combination with other known technologies or other technologies having the same functions as those known technologies.

[0023] In the following description, in order to clearly show the structure and working method of the present invention, many directional words will be used to describe, but "front", "rear", "left", "right", "outer", "inner" should be used Words such as ", "outward", "inward", "upper" and "lower" are to be understood as convenient terms, and should not be understood as restrictive terms. In addition, the term "X-axis or X-direction" used in the following description mainly refers to...

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PUM

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Abstract

The invention discloses a pre-aligning device for a photoetching device. The pre-aligning device comprises: a lighting source for providing a collimated light beam; a beam splitting optical unit for splitting the beam into two beams of collimated light; a grating unit, wherein two sets of moire fringes is formed after the grating unit is irradiated by the two beams of collimated light; and an optical detection matrix for detecting the moire fringes. The grating unit comprises two groups of circular gratings, and each group of circular gratings includes a first circular grating and the second circular grating. The present invention also discloses a pre-alignment method for the for photoetching device.

Description

technical field [0001] The invention relates to the field of integrated circuit device manufacturing, in particular to a pre-alignment device and method for photolithography equipment. Background technique [0002] A photolithography machine is a kind of equipment used in the manufacture of integrated circuits. The use of this equipment includes but is not limited to: photolithography equipment for integrated circuit manufacturing, liquid crystal panel photolithography equipment, photomask marking equipment, MEMS (micro-electromechanical systems) / MOMS (micro-optical machine system) lithography equipment, advanced packaging lithography equipment, printed circuit board lithography equipment and printed circuit board processing equipment, etc. [0003] The mask pre-alignment of the lithography machine is to pre-align the mask with the optical axis of the lithography objective lens within a certain alignment accuracy range, including the alignment of the horizontal displacemen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F9/00G03F7/20
Inventor 蓝科杜聚有徐荣伟
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD