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Substrate for display panel and substrate exposure method

An exposure method and a display panel technology, which are applied in microlithography exposure equipment, photolithography exposure devices, optics, etc., can solve the problems of high mask prices, opening position shifts, and size increases.

Inactive Publication Date: 2016-04-27
SHARP KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In such an exposure method, the size of the mask needs to be increased along with the increase in the size of the substrate, leading to an increase in the price of the mask.
In addition, when the size of the mask is increased, the positional displacement of the opening due to deflection is likely to occur.

Method used

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  • Substrate for display panel and substrate exposure method
  • Substrate for display panel and substrate exposure method
  • Substrate for display panel and substrate exposure method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0055] refer to Figure 1-11 The substrate for a display panel of this embodiment and the exposure method using this substrate are demonstrated.

[0056] figure 1 is a schematic perspective view showing the state before exposing the display region in the exposure method of Embodiment 1, figure 2 It is a schematic perspective view showing a state in which the display region is being exposed in the exposure method according to the first embodiment.

[0057] The exposure method of the board|substrate of this embodiment uses what is called a so-called "scan (scan) exposure". Such as figure 1 and 2 As shown, the mother glass substrate 10 is moved while irradiating ultraviolet rays to the surface of the mother glass substrate 10 through the light transmitting portion of the mask 50 using a mask 50 formed with a slit-shaped light transmitting portion. figure 1 , 2 Arrows in indicate the moving direction of the mother glass substrate 10 . The exposure method of the present ...

Embodiment approach 2

[0094] This embodiment shows another example of the alignment mark arranged in the frame region of the substrate for a display panel. Figure 12 It is a schematic plan view showing an enlarged alignment mark formed on a substrate for a display panel according to Embodiment 2. FIG. Such as Figure 12As shown, in this embodiment, a slit-shaped notch (removed part) with a width (W) of 15 μm and a length (L) of about 500 μm is provided in the member arranged in a planar form, and the notch is used Make alignment marks. As the above-mentioned planarly arranged member, if it is arranged at a position away from the display area corresponding to the array substrate by 2 mm to 50 mm, a metal member formed in the same process as the source signal line can be used. When the display area corresponding to the color filter substrate is separated by 2 mm to 50 mm, a light shielding member formed in the same process as the black matrix can be used. The center line of the notch is formed at...

Embodiment approach 3

[0096] This embodiment shows another example of the alignment mark arranged in the frame region of the substrate for a display panel. Figure 13 It is a schematic plan view showing an enlarged alignment mark formed on a substrate for a display panel according to Embodiment 3. FIG. Such as Figure 13 As shown, in this embodiment, the alignment mark has an H shape, and the upper end and the lower end of a straight line portion with a width (W) of 15 μm and a length (L) of about 500 μm are connected at right angles to their midpoints. A straight line extending in the left and right directions. If it is installed at a position away from the display area corresponding to the array substrate by 2 mm to 50 mm, a metal member formed in the same process as the source signal line can be used. When the display area is separated by 2 mm to 50 mm, a light shielding member formed in the same process as the black matrix can be used. The center line of the alignment mark is formed at a pos...

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Abstract

The present invention provides a substrate for a display panel and a substrate exposure method such that it is possible to accurately commence an exposure in a prescribed direction from a prescribed location. The present invention relates to a substrate for a display panel, comprising: a display region wherein a plurality of pixels are arrayed; and a frame region which is adjacent to the display region. The substrate for the display panel further comprises alignment marks within the frame region. The centers of the alignment marks are in locations 2mm or more distant from the display region.

Description

technical field [0001] The invention relates to a substrate for a display panel and a substrate exposure method. More specifically, it relates to a substrate for a display panel suitable for scanning exposure performed in a photo-alignment treatment step of an alignment film, and an exposure method for the substrate. Background technique [0002] Alignment treatment is performed on the alignment film formed on the surface of the TFT array substrate and the color filter substrate of the liquid crystal display panel to align liquid crystal molecules in a predetermined direction. Conventionally, as a method of this orientation treatment, rubbing by a fiber material has generally been used, but recently, photo-alignment treatment has been used as a method of orientation treatment instead of it. [0003] The photo-alignment treatment is a treatment for imparting predetermined alignment characteristics to the surface of the alignment film by irradiating the alignment film with li...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02F1/1337
CPCG02F1/1362G02F1/136209G03F9/7011G02F1/133354
Inventor 田中茂树胡内宏树
Owner SHARP KK