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Method for manufacturing color filter and color filter

A color filter, color filter technology, applied in the direction of filter, optics, optical components, etc., can solve the problem of no white glass area and so on

Inactive Publication Date: 2013-11-13
BOE TECH GRP CO LTD +1
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  • Abstract
  • Description
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  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, when making large-sized panels, due to the need for multiple splicing, there is no corresponding white glass area to place alignment marks

Method used

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  • Method for manufacturing color filter and color filter
  • Method for manufacturing color filter and color filter
  • Method for manufacturing color filter and color filter

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Embodiment Construction

[0046] In order to make the technical problems, technical solutions and advantages to be solved by the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.

[0047] The following combination Figure 2-Figure 9 , describing a method for manufacturing a color filter according to the present invention. Such as figure 2 As shown, the method includes:

[0048] Step 21, providing a glass substrate 61;

[0049] Step 22, setting a layer of black matrix material on the glass substrate 61;

[0050] Step 23, exposing the black matrix material to form a first substrate pattern layer, the first substrate pattern layer includes: a black matrix 21, an alignment mark 22, and a pixel opening area; wherein, the glass substrate is not covered with The area covered by the black matrix forms the pixel opening area, and the alignment mark is located in the pixel opening area. image 3 Schematically show the top view of the c...

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Abstract

The invention provides a method for manufacturing a color filter and the color filter. The method for manufacturing the color filter comprises the steps that a glass substrate is provided, and a black matrix material is arranged on the glass substrate, and exposed to form a first substrate pattern layer comprising black matrixes, alignment marks and pixel opening areas, wherein places not covered by the black matrixes on the glass substrate form the pixel opening areas, and the alignment marks are positioned in the pixel opening areas. According to the method, the alignment marks are arranged in the pixel opening areas of the first substrate pattern layer, a mask plate is aligned with the substrate by the alignment marks in a subsequent technology, and the alignment marks do not occupy additional positions, so that the method can be suitable for a scene requiring splicing exposure when the large panel color filter is produced.

Description

technical field [0001] The invention relates to the field of manufacturing color filters, in particular to a method for manufacturing a color filter and the color filter. Background technique [0002] In the existing production process of CF (Color Filter), in the production of BM (black matrix), R (red color filter film), G (green color filter film), B (blue color filter film), PS (spacer ), the Exposure exposure process is required, and the PR photoresist is exposed to the required Pattern pattern in the form of proximity exposure through the Mask mask. In the exposure process, it is necessary to accurately align the Mask Alignment Mark alignment mark on the Mask mask with the Glass Alignment Mark alignment mark (made by BM black matrix process) on the substrate to ensure the correctness of the Pattern pattern. exposure. [0003] Such as figure 1 As shown, it is a schematic diagram of the alignment between the mask and the glass substrate in the prior art. When making a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20G03F7/00G03F9/00
CPCG02B5/201G03F7/0007G03F9/7084G02B1/12
Inventor 肖洋齐勤瑞许志军王恒英
Owner BOE TECH GRP CO LTD
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