Multiple quantum well for ultraviolet light emitting diode and a production method therefor
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CHIP TECH
- Publication Date
- 2014-04-02
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Abstract
Description
technical field
[0001] The present invention relates to multi-quantum wells for ultraviolet light-emitting diodes and a manufacturing method thereof. More specifically, it relates to an atomic layer deposition method (Atomic Layer Deposition; ALD) capable of achieving low-temperature deposition, which alternately forms barrier layers of high-quality thin films A multi-quantum well for an ultraviolet light-emitting diode capable of effectively suppressing dislocation and a quantum well layer and a manufacturing method thereof. Background technique
[0002] Recently, GaN-based light-emitting diodes (Light Emitting Diodes; LEDs) have attracted attention as next-generation light-emitting elements that can maximize energy saving. The light-emitting region of such GaN-based light-emitting diodes has expanded from visible light to ultraviolet rays.
[0003] Conventional light-emitting diodes with multiple quantum well structures use Metal Organic Chemical Vapor Deposition (MOCVD) t...