Unlock instant, AI-driven research and patent intelligence for your innovation.

Field emission electron source

A technology of field emission and electron source, which is applied in the field of field emission, can solve problems such as instability of field emission performance of electron source, shorten device life, increase load of electron source, etc., so as to increase the actual field emission area, meet high current density and long-term The effect of longevity

Active Publication Date: 2014-05-07
SHANGHAI UNITED IMAGING HEALTHCARE
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The cost of this solution is to increase the load of the electron source, which may lead to instability of the field emission performance of the electron source, thereby shortening the life of the corresponding device
Generally speaking, the technologies that have been reported so far do not have a satisfactory solution to this problem.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Field emission electron source
  • Field emission electron source
  • Field emission electron source

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] A field emission electron source of the present invention will be further described in detail below.

[0018] Please refer to figure 1 and figure 2 , the field emission electron source of the present invention includes an anode, a grid and a cathode, wherein the cathode is composed of a substrate and a field emission material. In this embodiment, the substrate is a cube-shaped cavity 1, the cavity 1 includes five surfaces and an open surface 4, each surface corresponds to an inner surface 2, and the emitting material is evenly distributed On the inner surface 2 (substrate), the five inner surfaces 2 are the emission surfaces of the field emission electron source. The open surface 4 is used as an exit surface for electron beams emitted from the emission surface.

[0019] The present invention effectively utilizes each inner surface 2 of the entire cavity 1 as an electron emission surface, and greatly increases the actual emission area of ​​electron beams compared wit...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a field emission electron source comprising a gate electrode, an anode and a cathode formed by field emission material. A substrate is a cavity with an opened surface. The field emission material is evenly arranged at the inner surface of the cavity to form a plurality of emitting surfaces. The field emission electron source can provide large field emission current density, the performance of the field emission electron source is stable, and the service life of the field emission electron source is long.

Description

technical field [0001] The invention relates to field emission technology, in particular to a field emission electron source. Background technique [0002] Field emission electron sources generate electrons using the so-called field emission effect. The emission of its electrons is completely controlled by the external electric field. In the design of the field emission electron source, if the electron emission performance of the field emission material used is certain, that is, the stable maximum field emission current density that can be obtained is certain, the electron source may produce The maximum stable current is proportional to the area of ​​the field electron emission surface. The electron emission surface of a common field emission electron source has a planar structure or a simple curved surface structure, and the cross-sectional size of the outgoing electron beam is usually close to the field electron emission area of ​​the electron source. [0003] In many ap...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01J29/04H01J31/04
Inventor 章健徐一鸣李冬松
Owner SHANGHAI UNITED IMAGING HEALTHCARE
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More