A photolithographic plate component and a method for detecting photolithographic alignment accuracy
A technology for lithography and inspection benchmarks, used in the original parts for opto-mechanical processing, semiconductor/solid-state device testing/measurement, optics, etc.
Inactive Publication Date: 2016-12-21
SHANGHAI INST OF SPACE POWER SOURCES
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Problems solved by technology
[0004] In order to solve the deficiencies of the existing lithography technology for alignment accuracy detection, the present invention provides a photoresist plate assembly and a method for detecting alignment accuracy of lithography
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[0021] Hereinafter, the present invention will be further described with reference to the drawings and embodiments.
[0022] The photoresist plate assembly provided by the present invention can include any photoresist plate according to the needs of the photolithography process. In this embodiment, two photoresist plates are used as an example to illustrate the present invention, and the negative photoresist is used. In the case of the detection mark, the light and dark areas of the detection mark can be interchanged, and the detection mark includes a detection reference pattern, an error display mark, a graphic protection area and a number pattern.
[0023] combined reference figure 1 and figure 2 , the photoresist plate assembly provided in this embodiment includes: a first photoresist plate used in the first step of lithography, a second photoresist plate used in the second step of photolithography; the first photoresist The engraving plate includes a first detection ref...
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The invention belongs to researches on photolithographic technology of the semiconductor field or the micro mechanical field, in particular relates to a photolithographic plate with an alignment accuracy detection mark, and a detection method, and discloses design, production and use methods of the alignment accuracy detection mark. On the photolithographic plate, not only an ordinary pattern area (1) and alignment mark (2) are produced, but also the alignment accuracy detection mark (3) is produced in a remaining blank area, and the alignment accuracy detection mark comprises four parts of a first detecting reference pattern (31), a pattern protection zone (32), a second error display mark (33) and a digital serial number pattern (34), and by cooperation of alignment accuracy detection marks produced on two or more than two different photolithographic plates, rapid alignment accuracy detection can be achieved in a photolithographic process. The photolithographic alignment accuracy detection method solves the problems that by the photolithographic technology in the prior art the alignment accuracy detection is inconvenient or cannot be performed in certain circumstances.
Description
technical field [0001] The invention belongs to the research of photolithography technology in the field of semiconductor or micromechanics, and relates to a photolithography plate component and a method for detecting the alignment accuracy of photolithography, and specifically relates to the design, production and use of marks and other aspects. Background technique [0002] In the field of semiconductor or micromechanics, it is necessary to go through multiple photolithography processes to form a specific microstructure, and the alignment accuracy of photolithography plays a key role in the performance of the device. In the current photolithography design, it generally includes two parts: the pattern area and the alignment mark. The corresponding device pattern and alignment mark are formed on the substrate during the first photolithography. The position of the photolithography plate is aligned until the alignment mark on the substrate coincides with the alignment mark on ...
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IPC IPC(8): G03F1/42G03F1/44G03F9/00H01L21/68H01L21/66
Inventor 雷刚沈恋英
Owner SHANGHAI INST OF SPACE POWER SOURCES