Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for Measuring Internal Quantum Efficiency and Internal Loss of Laser

A technology of internal quantum efficiency and quantum efficiency, which is applied in the field of measuring the internal quantum efficiency and internal loss of lasers, can solve the problems of complex operation, high cost and time consumption, large error, etc., achieve a wide range of applications, low cost, and eliminate discrete effect of error

Inactive Publication Date: 2017-02-08
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a method for measuring the internal quantum efficiency and internal loss of lasers, which is used to solve the problem of complex operation and large errors in the measurement methods in the prior art, and the cost and time also consume more problems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for Measuring Internal Quantum Efficiency and Internal Loss of Laser
  • Method for Measuring Internal Quantum Efficiency and Internal Loss of Laser
  • Method for Measuring Internal Quantum Efficiency and Internal Loss of Laser

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0034] see Figure 1 to Figure 5 . It should be noted that the diagrams provided in this embodiment are only schematically illustrating the basic idea of ​​the present invention, and only the components related to the present invention are shown in the diagrams rather than the number, shape and shape of the components in actual implementation. Dimensional drawing, the type, quantity and proportion of each component can be changed arb...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for measuring the internal quantum efficiency and the internal loss of a laser through changing the effective reflectivity with an external optical feedback device. The method comprises the following steps: S1: an external optical feedback device is arranged on a laser optical path; S2: a cavity surface of the laser and a mirror surface of the external optical feedback device are equivalent to an equivalent cavity surface, and through change of the reflectivity of the external optical feedback device, the feedback intensity is adjusted and the output power of the laser is changed; S3: the current - power relationships of the laser at different feedback intensities are measured and a plurality of I - P curves are obtained; S4: the external differential quantum efficiency of each feedback intensity is calculated from the I - P curve; and S5: the internal quantum efficiency and the internal loss of the laser are obtained through fitting on the basis of the functional relationship between the external differential quantum efficiency and the reflectivity of the external optical feedback device. The method is characterized by needing only one laser, so that the method eliminates discrete errors brought by multi-laser measurement. Meanwhile, the method is convenient and fast with a low cost and high reliability.

Description

technical field [0001] The invention belongs to the fields of semiconductor optoelectronic technology and optical engineering, and relates to a method for measuring the internal quantum efficiency and internal loss of a laser. Background technique [0002] Since the semiconductor laser was born in 1962, the performance of the device has been rapidly improved, and it has been widely used in many fields, such as optical fiber communication, laser processing, laser medical treatment, spectroscopy, etc. From the perspective of market sales volume, the sales volume of semiconductor lasers is far greater than the sum of sales volumes of other types of lasers. In the development process of semiconductor lasers, the research and improvement of its waveguide structure and active region is the key to improving the performance of semiconductor lasers (“High Power Semiconductor Lasers for Deep Space Communications,” TDA Progress Report42-63, Jet Propulsion Laboratory, Pasadena, Calif. ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01R31/26G01M11/02
Inventor 汪洋龚谦柳庆博曹春芳成若海严进一李耀耀
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products