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Deposition apparatus

A technology of deposition equipment and deposition chamber, which is applied in ion implantation plating, gaseous chemical plating, coating, etc., and can solve problems such as inability to deposit pattern shapes

Inactive Publication Date: 2014-10-22
SAMSUNG DISPLAY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Until recently, fine metal masks (FMM) were commonly used to form organic thin films, however, precise pattern shapes cannot be deposited if the size of the glass substrate is larger than that of the sixth-generation substrate

Method used

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Embodiment Construction

[0033] In the following detailed description, only certain embodiments are shown and described, simply by way of illustration. As those skilled in the art would realize, the described embodiments may be modified in various ways, all without departing from the spirit or scope of the present invention. The drawings and descriptions are to be regarded as illustrative in nature and not restrictive. Like reference numbers generally refer to like elements throughout the specification.

[0034] The HPS process includes a process of forming an organic material on a film of a separate tray fastened to a glass substrate in a film deposition apparatus. Similar to the glass substrate, an ellipsometer was used as a film thickness gauge to monitor the thickness of the deposited film.

[0035] However, unlike glass substrates, alignment marks are not provided in the film, therefore, since no means for aligning the tray is provided in the ellipsometer, positional reproducibility with respec...

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Abstract

A deposition apparatus includes: a deposition chamber; a deposition source in the deposition chamber; a film fixing portion configured to fix a film, provided with a deposition surface to which the deposition material is deposited; and a protection plate in the deposition chamber to prevent the deposition material from being deposited to side and upper walls in the deposition chamber so as to control the deposition material to be deposited only to a valid film formation area. A first opening sized to correspond to the valid film formation area of the deposition surface and at least one second opening formed in an external area of the valid film formation area are formed in the protection plate, and, when the deposition material is deposited to the deposition surface by the deposition source, the deposition material passed through the second opening forms an alignment mark on the deposition surface.

Description

[0001] Any and all applications for which foreign or domestic priority claims are indicated on the Application Data Sheet filed with this application are hereby incorporated by reference. [0002] This application claims priority and benefit from Korean Patent Application No. 10-2013-0043040 filed with the Korean Intellectual Property Office on April 18, 2013, the entire contents of which are hereby incorporated by reference. technical field [0003] The described technique generally relates to a deposition apparatus that can deposit a deposition material on a film. Background technique [0004] Among display devices, an organic light emitting display has a wide viewing angle, excellent contrast ratio, and fast response speed, and thus, it has attracted attention as a next-generation display device. [0005] An organic light emitting diode (OLED) display typically includes a first electrode, a second electrode, an emission layer disposed between the first electrode and the s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44C23C16/52
CPCB05B15/045B05D1/32B05D1/60C23C14/042C23C14/50H05B33/10H10K71/00
Inventor 程相慜黄正宇
Owner SAMSUNG DISPLAY CO LTD