Substrate, mask plate and liquid crystal display device
A mask and substrate technology, which is applied in the fields of substrates, masks and liquid crystal display devices, can solve problems such as uneven thickness of liquid crystal cells, achieve uniform cell thickness and improve quality
Active Publication Date: 2017-06-27
BOE TECH GRP CO LTD +1
View PDF22 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0010] Embodiments of the present invention provide a substrate, a mask plate, and a liquid crystal display device, which solves the problem of the liquid crystal cell formed after the color filter substrate and the array substrate are aligned due to the lack of a large number of redundant PSs on the color filter substrate. problem of uneven thickness
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0035]The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0036] Embodiments of the present invention provide a substrate, such as image 3 and Figure 4 As shown, it includes a plurality of rectangular panel areas G arranged in an array along the horizontal direction P1 and the vertical direction P2, and each panel area G is used to make a color filter substrate; the panel area G includes four first alignment modules 31 , respectively arranged on the four corners of the panel area G; along the horizontal direction P1 or ...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention discloses a substrate, a mask plate and a liquid crystal display device, relates to the field of liquid crystal display and solves the problem that since a color film substrate is short of large amount of redundant PS, the thickness of a liquid crystal box by closing the color film substrate and array substrate is uneven. According to an embodiment, the substrate comprises panel regions provided with a plurality of rectangles arrayed in the horizontal and vertical directions, and each panel region is used for manufacturing one color film substrate; the panel region comprises four first alignment modules located at four corners of the panel region; the adjacent corners of two adjacent panel regions share one alignment module in the horizontal and vertical directions; the first alignment modules are located in the mask redundant region outside the panel redundant region. According to the embodiment, the invention further provided a liquid crystal display device and a mask plate used for forming patterns on the substrate.
Description
technical field [0001] The invention relates to the field of liquid crystal display, in particular to a substrate, a mask plate and a liquid crystal display device. Background technique [0002] A liquid crystal display device mainly includes a color filter substrate, an array substrate, and a liquid crystal material sandwiched between the two substrates. Wherein, the color filter substrate usually includes a glass substrate and a black matrix formed on the glass substrate, a coloring layer and a support pillar (PhotoSpacer, referred to as: PS). [0003] The preparation of the colored layer and the supporting columns is carried out after forming a black matrix on the glass substrate, and the preparation method includes: using a mask plate E (such as figure 1 shown) to expose the photosensitive film layer coated on the glass substrate on which the black matrix has been formed; then develop and bake the exposed photosensitive film layer, and finally form the colored layer and...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1335G03F1/42
CPCG02F1/133512G03F1/42
Inventor 汪栋陈华斌
Owner BOE TECH GRP CO LTD