A kind of photosensitive resin composition and its preparation method and application

A technology of photosensitive resin and resin composition, which is applied in the direction of optomechanical equipment, photosensitive materials used in optomechanical equipment, optics, etc., can solve the problems of PS easy-to-clean elastic recovery, etc., and achieve strong constructability and display performance Excellent, good elastic recovery effect

Active Publication Date: 2020-08-04
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of this, the present invention provides a photosensitive resin composition for forming a photo-spacer and its preparation method and application, so as to solve the problems that the existing PS is easy to wipe and has poor elastic recovery during large-curvature bending

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of photosensitive resin composition and its preparation method and application
  • A kind of photosensitive resin composition and its preparation method and application
  • A kind of photosensitive resin composition and its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0092] In the second aspect, the embodiment of the present invention also provides a method for preparing a photosensitive resin composition, comprising the following steps:

[0093] The photopolymerizable monomer, the resin composition, the auxiliary agent, and the photoinitiator are sequentially added into the solvent at a temperature of 60-200° C. and fully stirred to obtain a photosensitive resin composition. The mass percent content of each raw material in the photosensitive resin composition is as above.

[0094] Optionally, the temperature of the solvent is 60-130°C.

[0095] In one embodiment of the present invention, the preparation process of the photosensitive resin composition is as follows:

[0096] A part of the solvent was added into the reaction kettle, nitrogen gas was blown in and the mixture was stirred and heated to 130°C. Next, add the photopolymerizable monomer, resin composition, auxiliary agent, and photoinitiator into the above reaction kettle in seq...

Embodiment 1

[0117] A photosensitive resin composition, comprising the following raw materials in mass percent:

[0118] Modified polyurethane (Mn is 20000, the structural formula is shown in formula (1)): 1.6%;

[0119] Alkali-soluble resin (Mn is 20000, acid value is 32mgKOH / g, its monomer is methacrylic acid): 3%;

[0120] Acrylic resin (its monomer is methyl methacrylate): 1.5%;

[0121] Epoxy acrylate resin (its monomer is glycidyl methacrylate): 1.1%;

[0122] Hydroxyacrylate resin (its monomer is 2-hydroxyethyl methacrylate): 1%;

[0123] Photopolymerizable monomer (3% trimethylolpropane triacrylate and 2.5% pentaerythritol triacrylate) 5.5%;

[0124] Photoinitiators (specifically 0.48% of 2,2-dimethoxy-2-phenylacetophenone and 0.08% of 2-methyl-1-[4-(methylthio)phenyl]-2 -(4-morpholino)-1-propanone) 0.56%;

[0125] Solvent (specifically 62% propylene glycol monomethyl ether acetate, 10% cyclohexanone and 13% ethyl 3-ethoxypropionate): 85%;

[0126] Leveling agent (specificall...

Embodiment 2

[0129] A photosensitive resin composition, comprising the following raw materials in mass percent:

[0130] Modified polyurethane (Mn is 22000, the structural formula is shown in formula (3)): 2%;

[0131] Alkali-soluble resin (Mn is 20000, acid value is 35mgKOH / g, its monomer is α-chloromethacrylic acid): 4%;

[0132] Acrylic resin (its monomer is ethyl methacrylate): 2%;

[0133] Epoxy acrylate resin (its monomer is methacrylate-2,3-epoxypentyl ester): 1.5%;

[0134] Hydroxyacrylate resin (di(meth)acrylate whose monomer is 2-hydroxy-2-ethyl-1,3-propanediol): 1.8%;

[0135] Photopolymerizable monomer (specifically 4% of pentaerythritol triacrylate and 4% of dipentaerythritol pentamethacrylate) 8%;

[0136] Photoinitiator (specifically benzimidazole): 1.2%;

[0137] Solvent (60% propylene glycol monomethyl ether acetate and 15% methoxybutyl acetate) 75%;

[0138] Leveling agent (specifically BYK 306): 0.5%;

[0139] Adhesion promoter (specifically aminopropyltrimethoxysi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
acid valueaaaaaaaaaa
acid valueaaaaaaaaaa
acid valueaaaaaaaaaa
Login to view more

Abstract

The invention provides a photosensitive resin composition for a light spacer, which comprises a photopolymerization monomer, a resin composition, an auxiliary agent, a photoinitiator and a solvent ina specific ratio, wherein the resin composition comprises a modified polyurethane of a specific structure, an alkali-soluble resin, an acrylate resin and an epoxy acrylate resin, and the modified polyurethane has self-healing property. A light spacer film layer formed from the photosensitive resin composition can have good elastic recovery and strong adhesion to the substrate. The obtained opticalspacer film scrapes in the process of large curvature bending, which can also recover quickly and reduce the risk of the optical spacer pattern fracture. The invention also provides a preparation method and an application of the photosensitive resin composition.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a photosensitive resin composition and a preparation method and application thereof. Background technique [0002] Curved displays are highly regarded by high-end consumer groups because of their wrap-around look and feel, which can bring the same visual experience from all sides to the center. Existing curved displays are usually formed by bending a liquid crystal display panel (Liquid Crystal Display, TFT-LCD) and a backlight assembly, and usually use a photo spacer (photo spacer, PS) to make a certain gap between the upper and lower substrates of the liquid crystal display panel. The space between the two substrates allows the liquid crystal molecules to be driven. However, during the bending process, the upper and lower substrates of the liquid crystal display panel will undergo relative displacement, and the PS is generally set on the black matrix layer located on the colo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/004
CPCG03F7/004G03F7/027
Inventor 张霞刘刚陈孝贤
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap